Cu-TiO_2/ITO膜的制备、表征及其光电化学活性的研究

Preparation, Characterization and Photoelectrochemical Activities of Cu-TiO_2/ITO Films

以甲酸作空穴捕获剂,采用直接光还原法将Cu2+沉积到TiO2膜表面制备纳米Cu TiO2/ITO膜.并分别应用紫外可见光漫反射、X 射线衍射、扫描电镜及光开路电压等实验表征.再以甲酸为模型化合物,研究Cu沉积和外加电场对TiO2光催化活性的协同增强作用.结果表明:沉积在TiO2膜表面的铜是以Cu(0)形式存在,Cu沉积对抑制光生电子 空穴的复合有明显的促进作用.于Cu TiO2/ITO膜电极施加适当正偏压,即能明显提高其催化活性.在本文实验条件下,以外加电场和Cu沉积相结合能使TiO2光催化降解甲酸的速率常数增加2.8倍.

Cu-TiO_(2)/ITO films were prepared by direct photo-reduction deposition of Cu^(2+) on TiO_(2)/ITO films. The nanocomposite films were characterized by UV-vis diffuse reflectance spectra (DRS), XRD spectra, Scanning Electron Microscope (SEM) technology, and photovoltage measurement. The feasibility of improving the photocatalytic activity of TiO_(2) film by combining the modification of Cu nanoparticles with the application of anodic bias was investigated. The experimental results showed that the deposited Cu has an apparent enhancement effect with respect to suppressing the recombination between the photogenerated charge carriers and enhancing the photocatalytic oxidation of formic acid. The combination could promote the photocatalytic oxidation of formic acid on the film, with respect to the degradation of formic acid, the rate constant in PEC degradation of Cu-TiO_(2)/ITO film increased by a factor of 2.8 relative to that of TiO_(2)film.