金刚石薄膜自支撑窗口试样的制备与实验研究

The Fabrication and Test of Free-Standing Window Sample of Diamond Thin Films

以氢气和丙酮为原料,采用电子增强热丝CVD法,在硅片(100)基底上涂覆一层金刚石薄膜,在传统的硅平面加工工艺的基础上发展了一种新的在沉积好的基片上制备自支撑窗口试样的方法,并采用光刻法和湿式各向异性刻蚀技术制备得到金刚石薄膜自支撑窗口试样.研究表明,所制备的金刚石薄膜自支撑窗口的形状比较规则,膜内残留内应力小,能很好地满足鼓泡实验的要求,可以用来定量检测金刚石薄膜膜基界面结合强度和综合评价薄膜力学性能,对于促进金刚石薄膜材料在半导体器件中的应用和推广具有积极的意义.

A diamond thin film was deposited on Si (100) using hydrogen and acetone as the gas source by the electron-enhanced hot filament chemical vapor deposition (HFCVD). A novel way to fabricate free-standing window of diamond thin films at Si underlay deposited was developed on the basis of traditional silicon micro-processing technology, and free-standing window sample of diamond thin films was fabricated by photolithography and anisotropic wet etching. According to the test results, the geometry of the window is good and the residual stress in films is poor. Thus, it is very adaptable for bulge/blister testing. This can be used to measure the diamond thin films adhesion and evaluate the mechanics performance of films, which will accelerate the applications and developments of diamond thin films in the fabrication field of semiconductor.