N-乙烯基咔唑对光电聚合物感光性的影响

The Effect of Vinyl Carbazole on the Photosensitivity of Polymeric Photodielectric Media

研究了在两种光电聚合物中加入N-乙烯基咔唑后,用氩离子激光器的514.5nm波长的光作全息记录的感光特性.两种材料为聚甲基丙烯酸甲酯(PMMA)和聚α-氰基丙烯酸乙酯(PECA),用苯醌(BQ)作敏化剂.结果表明,含有N-乙烯基咔唑(VCz)的光电聚合物对514.5nm的光吸收增加.由于VCz和BQ形成电荷转移络合物(CTC),使PMMA片提高了感光灵敏度.本文还探讨了PMMA型光电聚合物的光化学反应的机理。

Two kinds of polymeric photodielectric media with and without the addition of vinyl carbazole were characterized for their holographic photosensitivity using a 514.5nm argon laser line.The materials used were polymethyhnethacrylate (PMMA) and poly (ethyl - a-cyanoacrylate) (PECA) respectively with p-benzoquinone as the sensitizer. Vinyl carbazole was added to both media arid test results contrasted. It was found that the 514.5nm absorption on the media containing vinyl carbazole was enhanced. Owing to the charge-transfer complexes formed by p-benzoquinone with vinyl carbazole, the photosensitivity of the materials (PMMA) is increased. Mechanism of photochemical changes involved is also briefly discussed.