离子镀TiN膜层的阻扩散性

The Diffusion Resistance Of Ion-plated TiN Film

研究了用离子镀方法沉积 TiN 膜作为高温环境下耐热涂层和基体之间扩散壁障(中间阻挡层)的可行性。结果表明,有 TiN 中间层试样。其高温抗氧化性能明显提高,TiN 层在一定温度范围内有良好的稳定性和阻扩散性。阐述了以Al 为耐热涂层时,TiN 中间层阻挡 Al 原子扩散的机理。

The possibility of the ion-plated TiN film as a diffusion barrier(middle layer)between substrate and heat re- sistant coating at high temperature is studied.The results show that the oxidation resistance of the specimen with TiN middle layer inereases greatly,and that the TiN layer has excellant stability and diffusion resistance at certain temperature range.The mechanism of the TiN film as a diffusion barrier is explained as that it can prevent the Al atoms inside the resistant coating from diffusing into the substrate.