摘要
在物理气相沉积镀层工艺基础上发展了镀渗新工艺。文中研究了物理气相沉积镀渗新工艺的镀渗层特征及涂层工艺。
A new technique was developed on the bases of PVD costing and PVD diffusing technique. The properties of the coating and diffusing layer and the experimental process have been studied in this paper.
出处
《兵器材料科学与工程》
CAS
CSCD
北大核心
1993年第6期65-67,共3页
Ordnance Material Science and Engineering
