ZrO_2薄膜的相结构与相稳定性

PHASE STRUCTURE AND STABILITY OF ZIRCONIA THIN FILMS

采用纯 Zr、添 Y_2O_3的 ZrO_2和添 MgO 的 ZrO_2为靶材,以射频溅射方法生成 ZrO_2薄膜。研究了这三个系列薄膜的物相结构,以及退火和研磨对物相结构的影响。研究表明,ZrO_2薄膜为单斜相,Y-ZrO_2和 Mg-ZrO_2薄膜为单斜相和正方相,且以正方相为主。它们的退火规律也各不相同,这与稳定剂的加入与性质有关。同时研磨并未诱导正方相向单斜相的转变。

Zirconia thin films were deposited by r.f.magnetron reactive sputtering methodwith the pure metal Zr,compound Y-ZrO_2 and Mg-ZrO_2 targets.The phase structures of thethree series films were investigated,and the effect of annealing and stressing were studied too.The studies show that ZrO_2 thin films have monoclinic and Y-ZrO_2 and Mg-ZrO_2 thin filmshave tetragonal and monoclinic,but tetragonal is major phase;The three kinds of thin films ap-pear different phase transformation behaviour during anealing.And polishing and grinding theY-ZrO_2 thin films,their tetragonal phase could not be trasformed into monoclinic phase.