摘要
本文综述了直拉(CZ)硅单晶中与氧杂质有关的热施主现象的研究,阐述了硅中热施主的基本性质、基本理论、近期研究进展以及主要研究方向。
The properties of the thermal donor related to the oxygen impurity in Cz crystal,silicon have been discussed. The basic models and theories of the thermal donor have been presented. The research proceeding and the new research direction have been also pointed.
出处
《材料科学与工程》
CSCD
1993年第4期33-37,共5页
Materials Science and Engineering
关键词
热施主
硅
单晶
Thermal donor, silicon
