摘要
研究了在硅材料上利用MEMS (Micro-Electro-Mechanical System)的各向异性腐蚀技术制备 闪耀光栅。采用氧化削尖工艺去除光栅制备过程中掩膜在闪耀面上留下的平台,得到一个连续的闪耀面;同时对闪耀面进行表面抛光,改善闪耀面的粗糙度,减小对入射光的散射。理论分析和实验测试证明,该工艺方法能够将MEMS闪耀光栅的衍射效率提高10%左右。
Fabrication of blazed gratings with anisotropic etching MEMS on silicon materials is studied. To improve the diffraction efficiency of the grating, a method was described by means of surface polishing and oxidation sharpness. With the method, the unblazed stripes between the grooves were removed. And the reflection surface was smoothed at the same time. Theoretical analysis and experiments have demonstrated that the technology can improve the diffraction efficiency of MEMS blazed gratings for about 10% or so.
出处
《光电工程》
EI
CAS
CSCD
北大核心
2004年第5期24-27,37,共5页
Opto-Electronic Engineering
基金
微米纳米加工技术国家重点实验室基金(51485020101ZK3401)
上海市光科技专项行动计划项目(B-27)资助
关键词
闪耀光栅
各向异性腐蚀
表面抛光
氧化削尖
Blazed grating
Anisotropic etching
Surface polishing
Oxidation sharpness