摘要
提出了一种生长p-Si薄膜的ECR-PECVD等离子体系统。系统采用永磁铁和线圈相结合,改善反应室磁场的均匀性;微波窗口设计成多层结构,避免窗口污染;衬底托架移动和旋转利于改善生长膜的均匀性。
A plasma system of growing p-Si film by ECR-PECVD was put forward.Combining permanent magnet with magnet coil, the uniformity of magnet field of reaction chamber was improved. Microwave window was designed with multi-layer structures to avoid window contamination. Uniformity of growth film can be obtained by moving and rotating substrate holder.
出处
《液晶与显示》
CAS
CSCD
2004年第3期199-201,共3页
Chinese Journal of Liquid Crystals and Displays
基金
国家自然科学基金资助项目(No.19974046
59973020
60277033)
吉林省科委基金资助项目(No.20010579
20020603)
关键词
电子回旋共振
微波等离子体
p-Si薄膜
electron cyclotron resonance
microwave plasmas
polycrystalline silicon films
