摘要
热电材料可以实现热能与电能的直接转化,是一种无噪声污染、无有害物质排放、寿命长、可靠性高的能源材料。碲化铋基热电材料为室温区段性能最好的材料之一,具有巨大的应用潜力。本文利用射频磁控溅射法制备了碲化铋基热电薄膜,研究了溅射时间以及磁控溅射过程的衬底温度对薄膜热电性能的影响。利用XRD与SEM表征了薄膜的相、结晶情况以及表面情况,利用EDS分析了薄膜的化学计量比。同时测定了室温附近薄膜的塞贝克系数与电导率,计算了功率因子用以衡量不同工艺参数下薄膜的热电性能。从功率因子的计算结果可以看出,溅射时间为10 min的薄膜热电性能较优。
Thermoelectric material can realize the direct conversion of heat energy and electric energy. It is a kind of energy material without noise pollution, no harmful substance emission, long life and high reliability. As one of the most efficient thermoelectric materials at room temperature, Bi2Te3 has shown great potential for commercializing. Bi2Te3 thin films have been prepared by RF magnetron sputtering. The effect of sputtering time and substrate temperature on the thermoelectric properties of the films has been investigated. The phase, crystallization and surface conditions of the films were characterized by XRD and SEM, and the stoichiometry of the films was analyzed by EDS. Meanwhile, the Seebeck coefficient and electrical conductivity near room temperature films were determined, and in order to measure the thermoelectric properties under different process parameters for thin film, power factor was calculated. Finally, the sputtering time of 10 min film has the highest power factor.
出处
《材料化学前沿》
2017年第4期104-109,共6页
Advances in Material Chemistry
基金
清华大学实践教学教改研究项目(ZY01-2)。
