X射线双晶衍射在半导体材料及结构分析中的应用

Application of X-Ray Dual Crystal Diffraction in Semiconductor Materials and Structure Analysis

X射线双晶衍射是半导体材料及结构的重要分析手段,广泛应用于半导体薄膜,超晶格及量子阱等材料和器件的性能表征方面。文章综述了X射线双晶衍射在分析薄膜晶体质量,合金组分,超晶格膜厚,应变中的应用,对于半导体激光器而言,这些参数的精确测定,对指导高质量器件的开发与研制具有重要意义。

X-ray Dual crystal diffraction is an important analytical tool for semiconductor materials and structures. It is widely used in the characterization of materials and devices such as semiconductor thin films, superlattices and quantum wells. The article reviews the application of X-ray dual crystal diffraction in the analysis of film quality, alloy composition, superlattice film thickness and strain. For semiconductor lasers, the accurate measurement of these parameters is of great importance to the development and research of high-quality devices.