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The Use of Phase Portraits for the Study of the Generation-Recombination Processes in Semiconductor

The Use of Phase Portraits for the Study of the Generation-Recombination Processes in Semiconductor
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摘要 Theoretical investigation of generation-recombination processes in silicon, which has a lifetime of charge carriers 10-3 s and capture cross sections of 10-16 sm2. For the study uses a method of phase portraits, which are widely used in the theory of vibrations. It is shown that the form of phase portraits strongly depends on the frequency of exposure to the external variable deformation. Theoretical investigation of generation-recombination processes in silicon, which has a lifetime of charge carriers 10-3 s and capture cross sections of 10-16 sm2. For the study uses a method of phase portraits, which are widely used in the theory of vibrations. It is shown that the form of phase portraits strongly depends on the frequency of exposure to the external variable deformation.
出处 《Journal of Modern Physics》 2015年第13期1921-1926,共6页 现代物理(英文)
关键词 PHASE Portraits The GENERATION of CHARGE Carriers The Recombination of CHARGE Carriers Phase Portraits The Generation of Charge Carriers The Recombination of Charge Carriers
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