摘要
This paper presents an optimized asymmetric three corrugation-pitch-modulated DFB laser (3CPM-DFB) with extremely high mode selectivity(△αL= 0.97) and low flatness(F = 0.009), which are two key parameters to indicate the laser’s single longitudinal mode(SLM) performance. In threshold analysis, the optimization process based on transfer matrix method is demonstrated to maximize △αL?and minimize F simultaneously. In the above-threshold regime, the evolutions of △αL?and?longitudinal distribution of photon density with injection current are evaluated. More importantly, nanoimprint lithography which was proved an efficient way to fabricate DFB gratings can provide completely same simple fabrication procedure for both 3CPM grating and conventional uniform grating. So the big practical value of 3CPM-DFB can be expected because of its advanced performance and easy manufacturability.
This paper presents an optimized asymmetric three corrugation-pitch-modulated DFB laser (3CPM-DFB) with extremely high mode selectivity(△αL= 0.97) and low flatness(F = 0.009), which are two key parameters to indicate the laser’s single longitudinal mode(SLM) performance. In threshold analysis, the optimization process based on transfer matrix method is demonstrated to maximize △αL?and minimize F simultaneously. In the above-threshold regime, the evolutions of △αL?and?longitudinal distribution of photon density with injection current are evaluated. More importantly, nanoimprint lithography which was proved an efficient way to fabricate DFB gratings can provide completely same simple fabrication procedure for both 3CPM grating and conventional uniform grating. So the big practical value of 3CPM-DFB can be expected because of its advanced performance and easy manufacturability.
