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The Effect of Nitrogen Gas Flow Rate on the Cr-Containing DLC (Diamond-Like Carbon) Coating by AEGD Hybrid-CVD Coating Process 被引量:1

The Effect of Nitrogen Gas Flow Rate on the Cr-Containing DLC (Diamond-Like Carbon) Coating by AEGD Hybrid-CVD Coating Process
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摘要 The development of electric and hybrid automobiles has gained momentum with the growth of interest in the field of miniaturization of electrode materials. In particular, technologies that improve the electrical property of stainless steel, while maintaining corrosion resistance, are gaining interest in terms of maintaining specific resistivity. The study on metal doping in diamond-like carbon coating is currently in progress to enhance the characteristics of conductivity and corrosion resistance with excellent properties such as corrosion resistance and lubrication coating. It is the process of using Cr arc with DLC coating to actuate AEGD. The change of I(D)/I(G) (Graphite peak (G) and disordered bond peak (D)) ratio and G-peak position in Cr-containing DLC film causes graphitization and thus lowers the basic electric resistance. Simultaneous input of nitrogen gas leads to deposition of CrN by a specific ratio of Cr and N in the DLC coating, and the nitrogen atoms replace hydrogen in bonding to increase the sp3 bond structure in the DLC film, in which CrN is not deposited, to result in specific resistivity of a specific value or less. The development of electric and hybrid automobiles has gained momentum with the growth of interest in the field of miniaturization of electrode materials. In particular, technologies that improve the electrical property of stainless steel, while maintaining corrosion resistance, are gaining interest in terms of maintaining specific resistivity. The study on metal doping in diamond-like carbon coating is currently in progress to enhance the characteristics of conductivity and corrosion resistance with excellent properties such as corrosion resistance and lubrication coating. It is the process of using Cr arc with DLC coating to actuate AEGD. The change of I(D)/I(G) (Graphite peak (G) and disordered bond peak (D)) ratio and G-peak position in Cr-containing DLC film causes graphitization and thus lowers the basic electric resistance. Simultaneous input of nitrogen gas leads to deposition of CrN by a specific ratio of Cr and N in the DLC coating, and the nitrogen atoms replace hydrogen in bonding to increase the sp3 bond structure in the DLC film, in which CrN is not deposited, to result in specific resistivity of a specific value or less.
出处 《Advances in Materials Physics and Chemistry》 2017年第5期198-211,共14页 材料物理与化学进展(英文)
关键词 Cr(N)-C:H Film Nitrogen DOPING Graphitic Carbon Electrical RESISTIVITY Plasma CVD Arc Enhanced GLOW Discharge (AEGD) Cr(N)-C:H Film Nitrogen Doping Graphitic Carbon Electrical Resistivity Plasma CVD Arc Enhanced Glow Discharge (AEGD)
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