摘要
In this research we try to investigate the optimum etching time for the tracks originate in (CR-39) solid state nuclear track detector after irradiated with alpha source (<sup>241</sup>Am) using three different etching techniques: the traditional method (water bath), microwaves and ultrasound devices. The track etching parameters: bulk etch rate (V<sub>B</sub>), track etch rate (V<sub>T</sub>), track etch rate ratio evaluates (V), critical angle (θ<sub>C</sub>), and etching efficiency (η) were calculated in this research. It’s seen that the optimum etching time was ranging with (60 - 150 min), (20 - 30 min) and (60 - 120 min) when etching with water bath, microwave and ultrasound respectively. Also we observed that the critical angle was (24.29) when etching CR-39 detector with microwave. This value is lower than the critical angles values for the detector etched with water bath or ultrasound;thus it can be the optimum magnitude because its decrease leads to increasing the number of the tracks appeared in the detector and the etching efficiency.
In this research we try to investigate the optimum etching time for the tracks originate in (CR-39) solid state nuclear track detector after irradiated with alpha source (<sup>241</sup>Am) using three different etching techniques: the traditional method (water bath), microwaves and ultrasound devices. The track etching parameters: bulk etch rate (V<sub>B</sub>), track etch rate (V<sub>T</sub>), track etch rate ratio evaluates (V), critical angle (θ<sub>C</sub>), and etching efficiency (η) were calculated in this research. It’s seen that the optimum etching time was ranging with (60 - 150 min), (20 - 30 min) and (60 - 120 min) when etching with water bath, microwave and ultrasound respectively. Also we observed that the critical angle was (24.29) when etching CR-39 detector with microwave. This value is lower than the critical angles values for the detector etched with water bath or ultrasound;thus it can be the optimum magnitude because its decrease leads to increasing the number of the tracks appeared in the detector and the etching efficiency.
