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Mechanism of Silver Nanoparticles Deposition by Electrolysis and Electroless Methods on a Graphite Substrate

Mechanism of Silver Nanoparticles Deposition by Electrolysis and Electroless Methods on a Graphite Substrate
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摘要 This study shows a silver electrodeposition model (EDM) on a graphite substrate. The electrolyte was a 0.01 M solution of pure silver and chromium nitrate using an electrolyzing cell. EDC with current density up to 20 mA/cm<sup>2</sup> and 15 mV and pulse current were studied. Results revealed that silver deposited at a rate of 0.515 mg/cm<sup>2</sup>/min with 12 mA/cm<sup>2</sup> that decreases to 0.21 and 0.16 mg/cm<sup>2</sup>&#183;min with the decrease of current density to 6 and 5 mA/cm<sup>2</sup> respectively. The model postulates that silver ions (a) were first hydrated before diffusing (b) from the solution bulk to the cathode vicinity, The next step (c) involved the chemical adsorption of these ions on certain accessible sites of the graphite substrate (anode), The discharged entities (d) adhere to the graphite surface by Van der Vales force. Silver ions are deposited because the discharge potential of silver is low (0.38 mV) as compared to other metal ions like chromium (0.82 mV). Pulse current controls silver deposition due to flexibility in controlling steps (a)-(c) of the deposition mechanisms. Parameters like current density, current on-time, current-off time, duty cycle (ratio of current on time and total pulse time) and pulse frequency influenced the shape and size of the deposits. Step (b) suggested that silver particles were deposited in a monolayer thickness. The silver layer turned multiple after fully satisfying the accessible sites with the monolayer. The activation energy &#916;E value amounts to 86.32 kJ/mol/K. At high temperature and current density, homogeneous diffusion occurs. This study shows a silver electrodeposition model (EDM) on a graphite substrate. The electrolyte was a 0.01 M solution of pure silver and chromium nitrate using an electrolyzing cell. EDC with current density up to 20 mA/cm<sup>2</sup> and 15 mV and pulse current were studied. Results revealed that silver deposited at a rate of 0.515 mg/cm<sup>2</sup>/min with 12 mA/cm<sup>2</sup> that decreases to 0.21 and 0.16 mg/cm<sup>2</sup>&#183;min with the decrease of current density to 6 and 5 mA/cm<sup>2</sup> respectively. The model postulates that silver ions (a) were first hydrated before diffusing (b) from the solution bulk to the cathode vicinity, The next step (c) involved the chemical adsorption of these ions on certain accessible sites of the graphite substrate (anode), The discharged entities (d) adhere to the graphite surface by Van der Vales force. Silver ions are deposited because the discharge potential of silver is low (0.38 mV) as compared to other metal ions like chromium (0.82 mV). Pulse current controls silver deposition due to flexibility in controlling steps (a)-(c) of the deposition mechanisms. Parameters like current density, current on-time, current-off time, duty cycle (ratio of current on time and total pulse time) and pulse frequency influenced the shape and size of the deposits. Step (b) suggested that silver particles were deposited in a monolayer thickness. The silver layer turned multiple after fully satisfying the accessible sites with the monolayer. The activation energy &#916;E value amounts to 86.32 kJ/mol/K. At high temperature and current density, homogeneous diffusion occurs.
作者 Mahmoud A. Rabah Nabil Nassif Girgis Mahmoud A. Rabah;Nabil Nassif Girgis(Chemocal and Electrochemical Treatment Lab. Mineral Processing Dept. Central Metallurgical Research and Development Institute (CMRDI), El-Flezzat Str. El-Tebbin, Cairo, Egypt;Control and Surface Protection Lab, (CMRDI) El-Flezzat Str. El-Tebbin, Cairo, Egypt)
出处 《International Journal of Nonferrous Metallurgy》 CAS 2022年第1期1-14,共14页 有色冶金(英文)
关键词 Silver and Chromium Nanoparticles ELECTROLYSIS Electroless Deposition Chemical Deposition and Pulse Current Graphite Substrate Silver and Chromium Nanoparticles Electrolysis Electroless Deposition Chemical Deposition and Pulse Current Graphite Substrate
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