摘要
In this work, plasma-nitrided AISI 316L stainless steel samples were performed by ion nitriding process under pulsed direct current (DC) discharge at different current densities (1 to 2.5 mA/ cm2). The effect of nitriding current density on the size of crystalline coherently diffracting domains (crystallite size) and strain grade was investigated using X-ray diffraction (XRD) coupled with Williamson-Hall method. Additionally, hardness and wear resistance of the nitriding layer were characterized using a Vickers indenter and pin-on-disk technique respectively. Results showed a decrease in crystallite size from 99 nm for untreated samples to 1.4 nm for samples nitrided at 2.5 mA/cm2 promoted both: an increase in hardness from 226 HV25g to 1245 HV25g, and a considerably decrease in volume loss by wear effect.
In this work, plasma-nitrided AISI 316L stainless steel samples were performed by ion nitriding process under pulsed direct current (DC) discharge at different current densities (1 to 2.5 mA/ cm2). The effect of nitriding current density on the size of crystalline coherently diffracting domains (crystallite size) and strain grade was investigated using X-ray diffraction (XRD) coupled with Williamson-Hall method. Additionally, hardness and wear resistance of the nitriding layer were characterized using a Vickers indenter and pin-on-disk technique respectively. Results showed a decrease in crystallite size from 99 nm for untreated samples to 1.4 nm for samples nitrided at 2.5 mA/cm2 promoted both: an increase in hardness from 226 HV25g to 1245 HV25g, and a considerably decrease in volume loss by wear effect.
