摘要
An electrode development was needed with high efficiency and low costs as next generation solar cells. We attempted the electrode fabrication for a photoelectrochemical cell by immobilizing functional groups on a n-Si(111) surface. The immobilization was applied by hydrosilylation terminated with ester (hydrophobic) or carbonyl (hydrophilic) group. Results confirmed the immobilization on the Si surface by measuring ATR-FTIR and XPS.
An electrode development was needed with high efficiency and low costs as next generation solar cells. We attempted the electrode fabrication for a photoelectrochemical cell by immobilizing functional groups on a n-Si(111) surface. The immobilization was applied by hydrosilylation terminated with ester (hydrophobic) or carbonyl (hydrophilic) group. Results confirmed the immobilization on the Si surface by measuring ATR-FTIR and XPS.
