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Technology of Porous Tantalum Production

Technology of Porous Tantalum Production
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摘要 Ion-plasma sputtering and codeposition of ultrafine Ta and Cd particles on a moving substrate were used to prepare the solid solutions, in particular, the alloys with up to 66.2 at.% Cd in the form of coatings. In vacuum heat treatment cadmium evaporates at 700&degC from cadmium based solid solutions resulting in formation of a porous tantalum with a highly developed surface. The prepared tantalum-based materials assume the technological application of the investigation results. Ion-plasma sputtering and codeposition of ultrafine Ta and Cd particles on a moving substrate were used to prepare the solid solutions, in particular, the alloys with up to 66.2 at.% Cd in the form of coatings. In vacuum heat treatment cadmium evaporates at 700&degC from cadmium based solid solutions resulting in formation of a porous tantalum with a highly developed surface. The prepared tantalum-based materials assume the technological application of the investigation results.
作者 Yu. Zh. Tuleushev V. N. Volodin Е. А. Zhakanbaev V. N. Lisitsin A. A. Migunova A. S. Suleymenova Yu. Zh. Tuleushev;V. N. Volodin;Е. А. Zhakanbaev;V. N. Lisitsin;A. A. Migunova;A. S. Suleymenova(Institute of Nuclear Physics, Almaty, Republic of Kazakhstan)
出处 《World Journal of Nano Science and Engineering》 2016年第2期51-57,共7页 纳米科学与工程(英文)
关键词 TANTALUM CADMIUM Porous Structures Specific Surface Tantalum Cadmium Porous Structures Specific Surface
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