期刊文献+

Oxidation mechanism of aluminum nitride revisited 被引量:2

Oxidation mechanism of aluminum nitride revisited
原文传递
导出
摘要 Different from the oxidation kinetics of other nitrides,the oxide layer on AlN can easily reach tens of micrometers at a temperature above 1200 ℃.In the present study,the oxidation mechanism of AlN is investigated through microstructure observation.The analysis indicates that the oxide layer is full of small pores.The formation of pores generates additional surface area to induce further reaction.The reaction thus controls the oxidation in the temperature range from 1050 to 1350 ℃.The oxidation rate becomes slow as the oxide layer reaches a critical thickness.
出处 《Journal of Advanced Ceramics》 CSCD 2017年第1期27-32,共6页 先进陶瓷(英文)
  • 相关文献

同被引文献10

引证文献2

二级引证文献3

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部