采用普通接触曝光研制成栅长为 0 .2 5 μm的 Ga As基 In Al As/ In Ga As变组分高电子迁移率晶体管(MHEMT) ,测得其跨导为 5 2 2 m S/ m m,沟道电流密度达 4 90 m A/ mm,截止频率为 75 GHz,比同样工艺条件下Ga As基 In Ga P/ In Ga As ...采用普通接触曝光研制成栅长为 0 .2 5 μm的 Ga As基 In Al As/ In Ga As变组分高电子迁移率晶体管(MHEMT) ,测得其跨导为 5 2 2 m S/ m m,沟道电流密度达 4 90 m A/ mm,截止频率为 75 GHz,比同样工艺条件下Ga As基 In Ga P/ In Ga As PHEMT的性能有很大的提高 .对该器件工艺及结果进行了分析 ,提取了器件的交流小信号等效电路模型参数 ,并提出了进一步得到高稳定性、高性能器件的方法 .展开更多
A four-stage monolithic microwave integrated circuits （MMIC） low noise amplifier （LNA） operating from 23 to 36GHz is reported using commercially available 0.15μm PHEMT technology. The LNA is self-biased. To achie...A four-stage monolithic microwave integrated circuits （MMIC） low noise amplifier （LNA） operating from 23 to 36GHz is reported using commercially available 0.15μm PHEMT technology. The LNA is self-biased. To achieve a low noise characteristic, careful optimizations of gate width are performed to reduce gate resistance. Absorption circuits and an elaborate bias structure with a resistor-capacitor network are employed to improve stability. Multiple resonance points and negative feedback technologies are used to widen the bandwidth. Measurements show a noise figure （NF） of less than 2.0dB,and the lowest NF is only 1.6dB at a frequency of 31GHz. In the whole operation band,the LNA has a gain of higher than 26dB,and an input return loss and output return loss of more than 11 and 13dB,respectively. The output power at ldB compression gain of 36GHz is about 14dBm. The chip area is 2.4mm ×1mm.展开更多
GaAs PIN diodes optimized for X-band low loss and high isolation switch application are presented. The impact of diode physical characteristics and electrical parameters on switch performance is discussed. A new struc...GaAs PIN diodes optimized for X-band low loss and high isolation switch application are presented. The impact of diode physical characteristics and electrical parameters on switch performance is discussed. A new structure for GaAs PIN diodes is proposed and the fabrication process is described. GaAs PIN diodes with an on-state resistance of 〈2. 2Ω and off-state capacitance -〈20fF in the range of 100MHz to 12.1GHz are obtained.展开更多
By epitaxial layer structure design and key fabrication process optimization,a lattice-matched InP-based In0.53Ga0.47 As-In0.52Al0.48As HEMT with an ultra high maximum oscillation frequency （fmax） of 183GHz was fab-...By epitaxial layer structure design and key fabrication process optimization,a lattice-matched InP-based In0.53Ga0.47 As-In0.52Al0.48As HEMT with an ultra high maximum oscillation frequency （fmax） of 183GHz was fab- ricated. The fmax is the highest value for HEMTs in China. Also, the devices are reported, including the device structure, the fabrication process, and the DC and RF performances.展开更多
Lattice-matched In0.5 Ga0.47 As/In0.52 Al 0.48 As high electron mobility transistors （HEMTs） with a cutoff frequency （ft） as high as 218GHz are reported. This fT is the highest value ever reported for HEMTs in Chi...Lattice-matched In0.5 Ga0.47 As/In0.52 Al 0.48 As high electron mobility transistors （HEMTs） with a cutoff frequency （ft） as high as 218GHz are reported. This fT is the highest value ever reported for HEMTs in China. These devices also demonstrate excellent DC characteristics：the extrinsic transconductance is 980mS/mm and the maximum current density is 870mA/mm. The material structure and all the device fabrication technology in this work were developed by our group.展开更多
文摘采用普通接触曝光研制成栅长为 0 .2 5 μm的 Ga As基 In Al As/ In Ga As变组分高电子迁移率晶体管(MHEMT) ,测得其跨导为 5 2 2 m S/ m m,沟道电流密度达 4 90 m A/ mm,截止频率为 75 GHz,比同样工艺条件下Ga As基 In Ga P/ In Ga As PHEMT的性能有很大的提高 .对该器件工艺及结果进行了分析 ,提取了器件的交流小信号等效电路模型参数 ,并提出了进一步得到高稳定性、高性能器件的方法 .
文摘A four-stage monolithic microwave integrated circuits （MMIC） low noise amplifier （LNA） operating from 23 to 36GHz is reported using commercially available 0.15μm PHEMT technology. The LNA is self-biased. To achieve a low noise characteristic, careful optimizations of gate width are performed to reduce gate resistance. Absorption circuits and an elaborate bias structure with a resistor-capacitor network are employed to improve stability. Multiple resonance points and negative feedback technologies are used to widen the bandwidth. Measurements show a noise figure （NF） of less than 2.0dB,and the lowest NF is only 1.6dB at a frequency of 31GHz. In the whole operation band,the LNA has a gain of higher than 26dB,and an input return loss and output return loss of more than 11 and 13dB,respectively. The output power at ldB compression gain of 36GHz is about 14dBm. The chip area is 2.4mm ×1mm.
文摘利用电子运动速度过冲现象 ,设计出了一种新结构复合收集区 In Ga P/Ga As异质结双极晶体管 .这种结构不仅提高了器件的截止频率 ,而且降低了影响器件直流性能的补偿电压 .所制备器件的截止频率达到 77GHz,直流电流增益高达 10 0 ,补偿电压低至 70 m V .同时 ,把所制备器件的微波和直流特性与已发表的文献进行了比较 ,充分显示了这种结构的优越性 .
文摘GaAs PIN diodes optimized for X-band low loss and high isolation switch application are presented. The impact of diode physical characteristics and electrical parameters on switch performance is discussed. A new structure for GaAs PIN diodes is proposed and the fabrication process is described. GaAs PIN diodes with an on-state resistance of 〈2. 2Ω and off-state capacitance -〈20fF in the range of 100MHz to 12.1GHz are obtained.
文摘By epitaxial layer structure design and key fabrication process optimization,a lattice-matched InP-based In0.53Ga0.47 As-In0.52Al0.48As HEMT with an ultra high maximum oscillation frequency （fmax） of 183GHz was fab- ricated. The fmax is the highest value for HEMTs in China. Also, the devices are reported, including the device structure, the fabrication process, and the DC and RF performances.
文摘Lattice-matched In0.5 Ga0.47 As/In0.52 Al 0.48 As high electron mobility transistors （HEMTs） with a cutoff frequency （ft） as high as 218GHz are reported. This fT is the highest value ever reported for HEMTs in China. These devices also demonstrate excellent DC characteristics：the extrinsic transconductance is 980mS/mm and the maximum current density is 870mA/mm. The material structure and all the device fabrication technology in this work were developed by our group.
