We present a grating imaging scanning lithography system for the fabrication of large-sized gratings. In this technology, ±1-order diffractive beams are generated by a phase grating and selected by a spatial filt...We present a grating imaging scanning lithography system for the fabrication of large-sized gratings. In this technology, ±1-order diffractive beams are generated by a phase grating and selected by a spatial filter. Meanwhile, a 4f system enables the ±1-order diffractive beams to form a grating image with a clear jagged-edge boundary on the substrate. A high-precision two-dimensional （2D） mobile stage is used for complementary cyclical scanning, thereby effectively eliminating image stitching errors. The absence of such errors results in a seamless and uniform large-sized grating. Characterized by a simple structure, high energy use, and good stability, this lithography system is highly relevant to the high-speed and cost- effective production of large-sized gratings.展开更多
A simplified modal method to explain the resonance phenomenon in guided mode resonance （GMR） grat- ings with asymmetric coatings is presented. The resonance observed is due to the interaction of two propagation mode...A simplified modal method to explain the resonance phenomenon in guided mode resonance （GMR） grat- ings with asymmetric coatings is presented. The resonance observed is due to the interaction of two propagation modes inside the grating. The reflectivity spectra and electric field distributions calculated from the simplified modal method are compared using rigorous coupled-wave analysis （RCWA）. The in- fluences of high-order evanescent modes on the resonance peak are analyzed. A matrix Fabry-Perot （FP） resonance condition is developed to evaluate the resonance wavelength. An explanation for the resonance phenomenon observed based on the FP resonance phase condition is also proposed and demonstrated. The simplified method provides clear physical insights into CMR gratings that are useful for the analysis of a variety of other resonance gratings.展开更多
基金supported by the National Natural Science Foundation of China(Nos.61078050,60921004,and 61127013)the Shanghai Science and Technology Committee(No.11DZ2290302)
文摘We present a grating imaging scanning lithography system for the fabrication of large-sized gratings. In this technology, ±1-order diffractive beams are generated by a phase grating and selected by a spatial filter. Meanwhile, a 4f system enables the ±1-order diffractive beams to form a grating image with a clear jagged-edge boundary on the substrate. A high-precision two-dimensional （2D） mobile stage is used for complementary cyclical scanning, thereby effectively eliminating image stitching errors. The absence of such errors results in a seamless and uniform large-sized grating. Characterized by a simple structure, high energy use, and good stability, this lithography system is highly relevant to the high-speed and cost- effective production of large-sized gratings.
基金supported by the National Natural Science Foundation of China (Nos. 61078050,60921004,and 61127013)the Shanghai Science and Technology Committee (No. 11DZ2290302)
文摘A simplified modal method to explain the resonance phenomenon in guided mode resonance （GMR） grat- ings with asymmetric coatings is presented. The resonance observed is due to the interaction of two propagation modes inside the grating. The reflectivity spectra and electric field distributions calculated from the simplified modal method are compared using rigorous coupled-wave analysis （RCWA）. The in- fluences of high-order evanescent modes on the resonance peak are analyzed. A matrix Fabry-Perot （FP） resonance condition is developed to evaluate the resonance wavelength. An explanation for the resonance phenomenon observed based on the FP resonance phase condition is also proposed and demonstrated. The simplified method provides clear physical insights into CMR gratings that are useful for the analysis of a variety of other resonance gratings.
