We consider how to teleport two- and three-mode Einstein-Podolsky Rosen entangled states （｜η） and ｜Pt, X2, X3）） via a ｜Pt, X2, X3） quantum channel for continuous variables. Using the complete and orthogonal r...We consider how to teleport two- and three-mode Einstein-Podolsky Rosen entangled states （｜η） and ｜Pt, X2, X3）） via a ｜Pt, X2, X3） quantum channel for continuous variables. Using the complete and orthogonal representation of the entangled states, we can not only find the a complete basis set for the joint measurement but also propose the specific scheme of teleportation. Our calculation can be greatly simplified by using their Schmidt decompositions.展开更多
A novel angle-resolved scatterometer based on pupil optimization for feature profile measurement in a photolithography process is proposed.The impact of image sensor errors is minimized by optimizing the intensity dis...A novel angle-resolved scatterometer based on pupil optimization for feature profile measurement in a photolithography process is proposed.The impact of image sensor errors is minimized by optimizing the intensity distribution of the incident light using a spatial light modulator.The scatterometry sensitivity of feature measurement at different polarization conditions is calculated using the rigorous coupled-wave and first-order analyses,and the reproducibility of the scatterometer is evaluated.The results show that the sensitivity and reproducibility of the angle-resolved scatterometer increase by 90% and 40% with pupil optimization,respectively.展开更多
基金Project supported by the National Natural Science Foundation of China （Grant No 10475056）.
文摘We consider how to teleport two- and three-mode Einstein-Podolsky Rosen entangled states （｜η） and ｜Pt, X2, X3）） via a ｜Pt, X2, X3） quantum channel for continuous variables. Using the complete and orthogonal representation of the entangled states, we can not only find the a complete basis set for the joint measurement but also propose the specific scheme of teleportation. Our calculation can be greatly simplified by using their Schmidt decompositions.
文摘A novel angle-resolved scatterometer based on pupil optimization for feature profile measurement in a photolithography process is proposed.The impact of image sensor errors is minimized by optimizing the intensity distribution of the incident light using a spatial light modulator.The scatterometry sensitivity of feature measurement at different polarization conditions is calculated using the rigorous coupled-wave and first-order analyses,and the reproducibility of the scatterometer is evaluated.The results show that the sensitivity and reproducibility of the angle-resolved scatterometer increase by 90% and 40% with pupil optimization,respectively.
