FePt multilayer films with a boron underlayer are prepared on Si(100)substrates using magnetron sputtering and vacuum annealing is carried out to obtain the hard magnetic L10 phase.According to the microstructural and...FePt multilayer films with a boron underlayer are prepared on Si(100)substrates using magnetron sputtering and vacuum annealing is carried out to obtain the hard magnetic L10 phase.According to the microstructural and magnetic measurement results,the ordering of the FePt films is facilitated at low annealing temperatures while it is blocked at high ones by introducing boron.Moreover,(001)orientation of the samples is obviously improved by inserting a boron underlayer,which is further confirmed by the MFM analysis.The relevant mechanism is discussed by considering the diffusion of boron atoms and the consequential in-plane tensile stress.展开更多
基金by the National Natural Science Foundation of China under Grant No 50871007the Research Fund for the Doctoral Program of Higher Education of China.
文摘FePt multilayer films with a boron underlayer are prepared on Si(100)substrates using magnetron sputtering and vacuum annealing is carried out to obtain the hard magnetic L10 phase.According to the microstructural and magnetic measurement results,the ordering of the FePt films is facilitated at low annealing temperatures while it is blocked at high ones by introducing boron.Moreover,(001)orientation of the samples is obviously improved by inserting a boron underlayer,which is further confirmed by the MFM analysis.The relevant mechanism is discussed by considering the diffusion of boron atoms and the consequential in-plane tensile stress.
