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High Quality Zinc Sulfide Epitaxial Layers Grown by Metalorganic Chemical Vapour Deposition
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作者 fan, guanghan Liao, Qiwei +3 位作者 fan, Xiwu Zhang, Zhishun Li, Mei Zhang, Jiying 《Rare Metals》 SCIE EI CAS CSCD 1989年第2期37-42,共6页
ZnS films were successfully grown by metallorganic chemical vapour deposition (MOCVD) at atmospheric pressure on (100) GaAs substrates. The deposition was carried out at a substrate temperature between 280 approximate... ZnS films were successfully grown by metallorganic chemical vapour deposition (MOCVD) at atmospheric pressure on (100) GaAs substrates. The deposition was carried out at a substrate temperature between 280 approximately 550°C with optimisation of reactor design and growth conditions. The gas phase prereaction is effectively restrained. These epilayers exhibit high crystallographic quality and reveal a mirror surface morphology. The peak halfwidths of X-ray diffraction patterns from their (400) faces are within 0.06 approximately 0.09°. The epilayers grown on (111) GaAs, (112¯0) Al2O3 and (100) Si have proven to be single crystalline feature. The optical and electrical characteristics of ZnS epilayers are measured by photoluminescence, cathodeluminescence, and the Van der Pauw method. The results indicate that there are not a large number of deep centers that could be detected both at 77K and at room temperature. A broad CL peak around 2.897eV and 2.672eV was observed only under very strong excitation. Their origin has not been examined. All epilayers present high resistivities up to 1013Ω&middotcm. 展开更多
关键词 CRYSTALS Epitaxial Growth Optical Properties Measurements ORGANOMETALLICS Chemical Vapor Deposition Semiconducting Gallium Arsenide SUBSTRATES Semiconducting Zinc Compounds
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