期刊文献+
共找到2篇文章
< 1 >
每页显示 20 50 100
Lewis acid-doped transition metal dichalcogenides for ultraviolet–visible photodetectors
1
作者 Heng yang Mingjun Ma +6 位作者 Yongfeng Pei Yufan Kang jialu yan Dong He Changzhong Jiang Wenqing Li Xiangheng Xiao 《Chinese Physics B》 SCIE EI CAS CSCD 2024年第9期628-635,共8页
Ultraviolet photodetectors(UV PDs)are widely used in civilian,scientific,and military fields due to their high sensitivity and low false alarm rates.We present a temperature-dependent Lewis acid p-type doping method f... Ultraviolet photodetectors(UV PDs)are widely used in civilian,scientific,and military fields due to their high sensitivity and low false alarm rates.We present a temperature-dependent Lewis acid p-type doping method for transition metal dichalcogenides(TMDs),which can effectively be used to extend the optical response range.The p-type doping based on surface charge transfer involves the chemical adsorption of the Lewis acid SnCl_(4)as a light absorption layer on the surface of WS_(2),significantly enhancing its UV photodetection performance.Under 365 nm laser irradiation,WS_(2)PDs exhibit response speed of 24 ms/20 ms,responsivity of 660 mA/W,detectivity of 3.3×10^(11)Jones,and external quantum efficiency of 226%.Moreover,we successfully apply this doping method to other TMDs materials(such as MoS_(2),MoSe_(2),and WSe_(2))and fabricate WS_(2) lateral p–n heterojunction PDs. 展开更多
关键词 two-dimensional(2D)materials p-type doping transition metal dichalcogenides PHOTODETECTORS
下载PDF
Spatially selective p-type doping for constructing lateral WS_(2) p-n homojunction via low-energy nitrogen ion implantation
2
作者 Yufan Kang Yongfeng Pei +6 位作者 Dong He Hang Xu Mingjun Ma jialu yan Changzhong Jiang Wenqing Li Xiangheng Xiao 《Light(Science & Applications)》 SCIE EI CSCD 2024年第6期1159-1169,共11页
The construction of lateral p-n junctions is very important and challenging in two-dimensional(2D)semiconductor manufacturing process.Previous researches have demonstrated that vertical p-n junction can be prepared si... The construction of lateral p-n junctions is very important and challenging in two-dimensional(2D)semiconductor manufacturing process.Previous researches have demonstrated that vertical p-n junction can be prepared simply by vertical stacking of 2D materials.However,interface pollution and large area scalability are challenges that are difficult to overcome with vertical stacking technology.Constructing 2D lateral p-n homojunction is an effective strategy to address these issues.Spatially selective p-type doping of 2D semiconductors is expected to construct lateral p-n homojunction.In this work,we have developed a low-energy ion implantation system that reduces the implanted energy to 300 eV.Low-energy implantation can form a shallow implantation depth,which is more suitable for modulating the electrical and optical properties of 2D materials.Hence,we utilize low-energy ion implantation to directly dope nitrogen ions into few-layer WS_(2) and successfully realize a precise regulation for WS_(2) with its conductivity type transforming from n-type to bipolar or even p-type conduction.Furthermore,the universality of this method is demonstrated by extending it to other 2D semiconductors,including WSe_(2),SnS_(2) and MoS_(2).Based on this method,a lateral WS_(2) p-n homojunction is fabricated,which exhibits significant rectification characteristics.A photodetector based on p-n junction with photovoltaic effect is also prepared,and the open circuit voltage can reach to 0.39 V.This work provides an effective way for controllable doping of 2D semiconductors. 展开更多
关键词 IMPLANTATION DOPING Spatial
原文传递
上一页 1 下一页 到第
使用帮助 返回顶部