期刊文献+
共找到3篇文章
< 1 >
每页显示 20 50 100
Displacement of the retina after idiopathic macular hole surgery with different internal limiting membrane peeling patterns 被引量:3
1
作者 Jin Liu Zi-Zhong Hu +6 位作者 Xin-Hua Zheng Yuan-Long Li jun-long huang Er-Bing Cao Song-Tao Yuan Ping Xie Qing-Huai Liu 《International Journal of Ophthalmology(English edition)》 SCIE CAS 2021年第9期1408-1412,共5页
AIM:To explore retinal displacement after surgical treatment for idiopathic macular hole(IMH)with different internal limiting membrane(ILM)peeling patterns.METHODS:Totally 22 eyes from 20 patients with IMH were random... AIM:To explore retinal displacement after surgical treatment for idiopathic macular hole(IMH)with different internal limiting membrane(ILM)peeling patterns.METHODS:Totally 22 eyes from 20 patients with IMH were randomly allocated into two groups,N-T group(11 eyes)and T-N group(11 eyes).For patients in N-T group,ILM was peeled off from nasal to temporal retina.For patients in T-N group,ILM was peeled off from temporal to nasal retina.Preoperative,postoperative 1,3,and 6 mo,autofluorescence fundus images were collected for manual measurement of distances of fixed nasal(N),temporal(T),superior(S),and inferior(I)retinal points(bifurcation or crossing of retinal vessels)around the macula to the optic disc(OD).These were respectively defined as N-OD,T-OD,S-OD,and I-OD.The retinal displacement,macular holeclosure rate,and best corrected visual acuity(BCVA)were compared between the two groups after surgery.RESULTS:At postoperative 1,3,and 6 mo,the macula slipped toward the OD,manifested by the decreased T-OD,N-OD,S-OD,and I-OD(P<0.05).No significant difference was found in the T-OD,N-OD,S-OD,and I-OD between N-T group and T-N group.IMH closure rate was 100%both in N-T group and T-N group.There was no significant difference in BCVA between two groups(P<0.05).CONCLUSION:The macula slips toward the OD after successful macular hole surgery.The two different ILM peeling pattern show similar visual outcome and retinal displacement,which means ILM peeling directions are not the influencing factor of postoperative retinal displacement. 展开更多
关键词 retinal displacement idiopathic macular hole internal limiting membrane peeling VITRECTOMY
下载PDF
新型高分子基多孔炭材料的设计制备与功能化策略 被引量:3
2
作者 刘绍鸿 黄俊龙 +1 位作者 唐友臣 吴丁财 《高分子学报》 SCIE CAS CSCD 北大核心 2021年第7期679-686,I0001,共9页
多孔炭材料具有孔隙率丰富、导电率高、结构稳定以及物理化学性质可调等优点,广泛应用于能源储存与转换、吸附分离、催化、石油化工和生物医药等领域.原料结构是影响多孔炭材料结构和性能的关键因素.高分子理化结构丰富可调,且具有良好... 多孔炭材料具有孔隙率丰富、导电率高、结构稳定以及物理化学性质可调等优点,广泛应用于能源储存与转换、吸附分离、催化、石油化工和生物医药等领域.原料结构是影响多孔炭材料结构和性能的关键因素.高分子理化结构丰富可调,且具有良好的成炭性和形貌继承性,是制备高性能多孔炭材料的理想原料.本专论结合近期国内外研究进展以及我们课题组相关工作,系统总结了高分子衍生多孔炭材料的直接炭化法和模板法设计制备理论,讨论了炭骨架功能化策略,归纳了高分子的化学结构及微观形貌对多孔炭材料的孔道与骨架结构的影响规律,并展望了这一领域未来的研究方向. 展开更多
关键词 高分子 多孔炭材料 结构设计 可控制备 功能化
原文传递
Scaling analysis of current influence on Hastelloy surface roughness in electro-polishing process
3
作者 Feng Feng Xiang-Song Zhang +5 位作者 Ti-Ming Qu Yan-Yi Zhang Xiang Qian Bin-Bin Liu jun-long huang Ping-Fa Feng 《Rare Metals》 SCIE EI CAS CSCD 2019年第2期142-150,共9页
In this study, a series of Hastelloy tapes were electro-polished, and the dividing method was used to carry out a detailed investigation on the influence of polishing current(I) on root mean square(R_q) at various ima... In this study, a series of Hastelloy tapes were electro-polished, and the dividing method was used to carry out a detailed investigation on the influence of polishing current(I) on root mean square(R_q) at various image scales(L). The electro-polishing is found to be effective mainly at L smaller than 10μm, where the R_q–I relationship could be fitted by an exponential decay function with a residual roughness value. An approximate model of electro-polishing process was established to interpret the exponential decay function. This study provides a quantified insight into the electro-polishing process, which could help to obtain more understanding of its mechanism. 展开更多
关键词 Surface ROUGHNESS Scaling analysis ROOT mean square Atomic force microscopy Electro-polishing
原文传递
上一页 1 下一页 到第
使用帮助 返回顶部