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ZnO薄膜的粉靶溅射沉积 被引量:1
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作者 刘天柱 kiyotaka wasa +4 位作者 张淑仪 水修基 陈培狄 宋凤麒 王广厚 《南京大学学报(自然科学版)》 CAS CSCD 北大核心 2003年第4期532-539,共8页
氧化锌是一种重要的压电与光电材料,用粉靶代替常规的固体陶瓷靶溅射沉积ZnO薄膜,对基底的加热温度、溅射气压和氧气的混合比率等沉积条件对氧化锌薄膜特性的影响进行了研究,主要对沉积在玻璃基片上的ZnO薄膜进行了X-射线衍射(XRD)、扫... 氧化锌是一种重要的压电与光电材料,用粉靶代替常规的固体陶瓷靶溅射沉积ZnO薄膜,对基底的加热温度、溅射气压和氧气的混合比率等沉积条件对氧化锌薄膜特性的影响进行了研究,主要对沉积在玻璃基片上的ZnO薄膜进行了X-射线衍射(XRD)、扫描电镜(SEM)、原子力显微镜(AFM)以及台阶仪的测量和分析比较,用粉靶溅射的ZnO薄膜具有很好的C轴长相和很窄的衍射峰半宽(0.2°~0.27°)。因为ZnO膜在C轴方向有很强的压电性,从而也说明了用粉靶溅射的ZnO薄膜具有很好的压电特性。分析和测量结果显示用粉靶溅射ZnO薄膜的最佳条件是:(1)基片加热温度为300~400℃。(2)氧气的混合含量为0.5~0.8.(3)溅射气压为1~2 Pa。得出了利用粉靶溅射制备的ZnO薄膜与用陶瓷靶制备同样具有很好的性能。 展开更多
关键词 氧化锌薄膜 ZNO薄膜 粉靶溅射沉积 加热温度 溅射气压 压电性 半导体 制备方法
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Characterization of La-doped xBiInO_3(1-x)PbTiO_3 Piezoelectric Films Deposited by the Radio-Frequency Magnetron Sputtering Method 被引量:1
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作者 孙科学 张淑仪 +1 位作者 kiyotaka wasa 水修基 《Chinese Physics Letters》 SCIE CAS CSCD 2016年第6期49-52,共4页
La-doped and undoped xBiIn03-(1 - x)PbTi03 (BI-PT) thin films are deposited on (101)SrRuO3/(lOO)Pt/(lO0) MgO substrates by the rf-magnetron sputtering method. The structures of the films are characterized by... La-doped and undoped xBiIn03-(1 - x)PbTi03 (BI-PT) thin films are deposited on (101)SrRuO3/(lOO)Pt/(lO0) MgO substrates by the rf-magnetron sputtering method. The structures of the films are characterized by XRD and SEM, and the results indicate that the thin films are grown with mainly (100) oriented and columnar structures. The ferroelectricity and piezoelectricity of the BI-PT films are also measured, and the measured results illustrate that both performances are effectively improved by the La-doping with suitable concentrations. These results will open up wide potential applications of the films in electronic devices. 展开更多
关键词 of BI Characterization of La-doped xBiInO3 x)PbTiO3 Piezoelectric Films Deposited by the Radio-Frequency Magnetron Sputtering Method in by La PT
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Thermal Diffusivity of Film/Substrate Structures Characterized by Transient Thermal Grating Method 被引量:1
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作者 徐晓东 马頔 +2 位作者 张淑仪 罗爱华 kiyotaka wasa 《Chinese Physics Letters》 SCIE CAS CSCD 2008年第1期176-179,共4页
Transient thermal grating method is used to measure the thermal diffusivity of absorbing films deposited on transparent substrates. According to periodically modulated dielectric constant variations and thermoelastic ... Transient thermal grating method is used to measure the thermal diffusivity of absorbing films deposited on transparent substrates. According to periodically modulated dielectric constant variations and thermoelastic deformations of the thin films caused by the transient thermal gratings, an improved optical diffraction theory is presented. In the experiment, the probing laser beam reflectively diffracted by the thermal grating is measured by a photomultiplier at different grating fringe spaces. The thermal diffusivity of the film can be evaluated by fitting the theoretical calculations of diffraction signals to the experimental measured data. The validity of the method is tested by measuring the thermal diffusivities of absorbing ZnO films deposited on glass substrates. 展开更多
关键词 ACOUSTIC-WAVES THIN-FILMS
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High Ferroelectricities and High Curie Temperature of BiInO3PbTiO3Thin Films Deposited by RF Magnetron Sputtering Method
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作者 孙科学 张淑仪 kiyotaka wasa 《Chinese Physics Letters》 SCIE CAS CSCD 2018年第12期19-22,共4页
Properties of ferroelectric xBiInO3-(1-x)PbTiO3(xBI-(1-x)PT) thin films deposited on(101) SrRuO3/(200)Pt/(200) MgO substrates by rf magnetron sputtering method and effects of deposition conditions are inve... Properties of ferroelectric xBiInO3-(1-x)PbTiO3(xBI-(1-x)PT) thin films deposited on(101) SrRuO3/(200)Pt/(200) MgO substrates by rf magnetron sputtering method and effects of deposition conditions are investigated.The structures of the xBI-(1-x)PT films are characterized by x-ray diffraction and scanning electron microscopy.The results indicate that the thin films are grown with mainly(001) orientation. The chemical compositions of the films are analyzed by scanning electron probe and the results indicate that the loss phenomena of Pb and Bi elements depend on the pressure and temperature during the sputtering process.The sputtering parameters including target composition, substrate temperature, and gas pressure are adjusted to obtain optimum sputtering conditions. To decrease leakage currents,2 mol% La2 O3 is doped in the targets. The P-E hysteresis loops show that the optimized xBI-(1-x)PT(x = 0.24) film has high ferroelectricities with remnant polarization2 Pr = 80μC/cm2 and coercive electric field 2 EC = 300 kV/cm. The Curie temperature is about 640℃. The results show that the films have optimum performance and will have wide applications. 展开更多
关键词 In Pb MGO High Ferroelectricities and High Curie Temperature of BiInO3PbTiO3Thin Films Deposited by RF Magnetron Sputtering Method
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用电子束光刻术制造矩形孔菲涅尔微透镜阵列
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作者 Teruhiro Shiono Kentaro Sotsune +2 位作者 Osamu YamaZaki kiyotaka wasa 陆锡南 《应用光学》 CAS CSCD 1991年第4期54-58,共5页
本文提出一种矩形孔菲涅尔微透镜阵列。这些微透镜阵列的制作采用了专为制造微光学元件而研制的电子束写入系统。实验表明,这种透镜阵列具有聚焦均匀的特性,以及每一透镜具有衍射限聚焦特性,其效率为74%。
关键词 电子束光刻术 菲涅尔 微透镜 列阵
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