Structural and optical properties of ~ 20 nm Ge nanoislands grown on Si(100) by radio frequency (rI) magnetron sputtering under varying annealing conditions are reported. Rapid thermal annealing at a temperature...Structural and optical properties of ~ 20 nm Ge nanoislands grown on Si(100) by radio frequency (rI) magnetron sputtering under varying annealing conditions are reported. Rapid thermal annealing at a temperature of 600 ℃ for 30 s, 90 s, and 120 s are performed to examine the influence of annealing time on the surface morphology and photoluminescence properties. X-ray diffraction spectra reveal prominent Ge and GeO2 peaks highly sensitive to the annealing time. Atomic force microscope micrographs of the as-grown sample show pyramidal nanoislands with relatively high-density (~ 10^11 cm^-2). The nanoislands become dome-shaped upon annealing through a coarsening process mediated by Oswald ripening. The room temperature photoluminescence peaks for both as-grown (~ 3.29 eV) and annealed (~ 3.19 eV) samples consist of high intensity and broad emission, attributed to the effect of quantum confinement. The red shift (~ 0.10 eV) of the emission peak is attributed to the change in the size of the Ge nanoislands caused by annealing. Our easy fabrication method may contribute to the development of Ge nanostructure-based optoelectronics.展开更多
Controlled growth,synthesis,and characterization of a high density and large-scale Ge nanostructure by an easy fabrication method are key issues for optoelectronic devices.Ge quantum dots(QDs)having a density of~1011 ...Controlled growth,synthesis,and characterization of a high density and large-scale Ge nanostructure by an easy fabrication method are key issues for optoelectronic devices.Ge quantum dots(QDs)having a density of~1011 cm^(-2) and a size as small as~8 nm are grown by radio frequency magnetron sputtering on Si(100)substrates under different heat treatments.The annealing temperature dependent structural and optical properties are measured using AFM,XRD,FESEM,EDX,photoluminescence(PL)and Raman spectroscopy.The effect of annealing is found to coarsen the Ge QDs from pyramidal to dome-shaped structures as they grow larger and transform the nanoislands into relatively stable and steady state configurations.Consequently,the annealing allows the intermixing of Si into the Ge QDs and thereby reduces the strain energy that enhances the formation of larger nanoislands.The room temperature PL spectra exhibits two strong peaks at~2.87 eV and~3.21 eV attributed to the interaction between Ge,GeO_(x) and the possibility of the presence of QDs core-shell structure.No reports so far exist on the red shift~0.05 eV of the strongest PL peak that results from the effect of quantum confinement.Furthermore,the Raman spectra for the pre-annealed QDs that consist of three peaks at around~305.25 cm^(-1),409.19 cm^(-1) and 515.25 cm^(-1) are attributed to Ge-Ge,Ge-Si,and Si-Si vibration modes,respectively.The Ge-Ge optical phonon frequency shift(~3.27 cm^(-1))associated with the annealed samples is assigned to the variation of shape,size distribution,and Ge composition in different QDs.The variation in the annealing dependent surface roughness and the number density is found to be in the range of~0.83 to~2.24 nm and~4.41 to~2.14×10^(11)cm^(-2),respectively.展开更多
基金supported by the International Doctoral Fellowship (IDF), Ibnu Sina Institute for Fundamental Science Study and research grants of MoHE GUP. Vot No. 02H94 and 07J80
文摘Structural and optical properties of ~ 20 nm Ge nanoislands grown on Si(100) by radio frequency (rI) magnetron sputtering under varying annealing conditions are reported. Rapid thermal annealing at a temperature of 600 ℃ for 30 s, 90 s, and 120 s are performed to examine the influence of annealing time on the surface morphology and photoluminescence properties. X-ray diffraction spectra reveal prominent Ge and GeO2 peaks highly sensitive to the annealing time. Atomic force microscope micrographs of the as-grown sample show pyramidal nanoislands with relatively high-density (~ 10^11 cm^-2). The nanoislands become dome-shaped upon annealing through a coarsening process mediated by Oswald ripening. The room temperature photoluminescence peaks for both as-grown (~ 3.29 eV) and annealed (~ 3.19 eV) samples consist of high intensity and broad emission, attributed to the effect of quantum confinement. The red shift (~ 0.10 eV) of the emission peak is attributed to the change in the size of the Ge nanoislands caused by annealing. Our easy fabrication method may contribute to the development of Ge nanostructure-based optoelectronics.
基金Supported by the International Doctoral Fellowship(IDF),Universiti Teknologi Malaysia through Vote 06J33(GUP/MOHE).
文摘Controlled growth,synthesis,and characterization of a high density and large-scale Ge nanostructure by an easy fabrication method are key issues for optoelectronic devices.Ge quantum dots(QDs)having a density of~1011 cm^(-2) and a size as small as~8 nm are grown by radio frequency magnetron sputtering on Si(100)substrates under different heat treatments.The annealing temperature dependent structural and optical properties are measured using AFM,XRD,FESEM,EDX,photoluminescence(PL)and Raman spectroscopy.The effect of annealing is found to coarsen the Ge QDs from pyramidal to dome-shaped structures as they grow larger and transform the nanoislands into relatively stable and steady state configurations.Consequently,the annealing allows the intermixing of Si into the Ge QDs and thereby reduces the strain energy that enhances the formation of larger nanoislands.The room temperature PL spectra exhibits two strong peaks at~2.87 eV and~3.21 eV attributed to the interaction between Ge,GeO_(x) and the possibility of the presence of QDs core-shell structure.No reports so far exist on the red shift~0.05 eV of the strongest PL peak that results from the effect of quantum confinement.Furthermore,the Raman spectra for the pre-annealed QDs that consist of three peaks at around~305.25 cm^(-1),409.19 cm^(-1) and 515.25 cm^(-1) are attributed to Ge-Ge,Ge-Si,and Si-Si vibration modes,respectively.The Ge-Ge optical phonon frequency shift(~3.27 cm^(-1))associated with the annealed samples is assigned to the variation of shape,size distribution,and Ge composition in different QDs.The variation in the annealing dependent surface roughness and the number density is found to be in the range of~0.83 to~2.24 nm and~4.41 to~2.14×10^(11)cm^(-2),respectively.