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Specifications and control of spatial frequency errors of components in two-beam laser static holographic exposure for pulse compression grating fabrication 被引量:1
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作者 Chen Hu songlin wan +8 位作者 Guochang Jiang Haojin Gu Yibin Zhang Yunxia Jin Shijie Liu Chengqiang Zhao Hongchao Cao Chaoyang Wei Jianda Shao 《High Power Laser Science and Engineering》 SCIE CAS CSCD 2024年第1期1-12,共12页
The large-aperture pulse compression grating(PCG) is a critical component in generating an ultra-high-intensity, ultra-short-pulse laser;however, the size of the PCG manufactured by transmission holographic exposure i... The large-aperture pulse compression grating(PCG) is a critical component in generating an ultra-high-intensity, ultra-short-pulse laser;however, the size of the PCG manufactured by transmission holographic exposure is limited to large-scale high-quality materials. The reflective method is a potential way for solving the size limitation, but there is still no successful precedent due to the lack of scientific specifications and advanced processing technology of exposure mirrors. In this paper, an analytical model is developed to clarify the specifications of components, and advanced processing technology is adopted to control the spatial frequency errors. Hereafter, we have successfully fabricated a multilayer dielectric grating of 200 mm × 150 mm by using an off-axis reflective exposure system with Φ300 mm. This demonstration proves that PCGs can be manufactured by using the reflection holographic exposure method and shows the potential for manufacturing the meter-level gratings used in 100 petawatt class high-power lasers. 展开更多
关键词 high-power laser off-axis reflective exposure system pulse compression grating spatial frequency errors SPECIFICATIONS
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Laser-based defect characterization and removal process for manufacturing fused silica optic with high ultraviolet laser damage threshold 被引量:2
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作者 Xiaocong Peng Xin Cheng +7 位作者 Chaoyang Wei songlin wan Kaizao Ni Zhenqi Niu Yichi Han Zhigang Jiang Zhen Cao Jianda Shao 《Light(Advanced Manufacturing)》 2023年第3期181-194,共14页
Residual processing defects during the contact processing processes greatly reduce the anti-ultraviolet(UV)laser damage performance of fused silica optics,which significantly limited development of high-energy laser s... Residual processing defects during the contact processing processes greatly reduce the anti-ultraviolet(UV)laser damage performance of fused silica optics,which significantly limited development of high-energy laser systems.In this study,we demonstrate the manufacturing of fused silica optics with a high damage threshold using a CO_(2)laser process chain.Based on theoretical and experimental studies,the proposed uniform layer-by-layer laser ablation technique can be used to characterize the subsurface mechanical damage in three-dimensional full aperture.Longitudinal ablation resolutions ranging from nanometers to micrometers can be realized;the minimum longitudinal resolution is<5 nm.This technique can also be used as a crack-free grinding tool to completely remove subsurface mechanical damage,and as a cleaning tool to effectively clean surface/subsurface contamination.Through effective control of defects in the entire chain,the laser-induced damage thresholds of samples fabricated by the CO_(2)laser process chain were 41%(0%probability)and 65.7%(100%probability)higher than those of samples fabricated using the conventional process chain.This laser-based defect characterization and removal process provides a new tool to guide optimization of the conventional finishing process and represents a new direction for fabrication of highly damage-resistant fused silica optics for high-energy laser applications. 展开更多
关键词 Fused silica Laser materials processing Defect characterization Subsurface damage Process chain
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