Surface metallization of glass fiber(GF)/polyetheretherketone(PEEK)[GF/PEEK] is conducted by coating copper using electroplating and magnetron sputtering and the properties are determined by X-ray diffraction(XRD), sc...Surface metallization of glass fiber(GF)/polyetheretherketone(PEEK)[GF/PEEK] is conducted by coating copper using electroplating and magnetron sputtering and the properties are determined by X-ray diffraction(XRD), scanning electron microscopy(SEM), and electron backscatter diffraction(EBSD).The coating bonding strength is assessed by pull-out tests and scribing in accordance with GB/T 9286-1998.The results show that the Cu coating with a thickness of 30 μm deposited on GF/PEEK by magnetron sputtering has lower roughness, finer grain size, higher crystallinity, as well as better macroscopic compressive stress,bonding strength, and electrical conductivity than the Cu coating deposited by electroplating.展开更多
负氢离子源已经成为核聚变装置中性束加热系统的首选离子源,中国的负氢离子源研究尚处于起步阶段。在本论文中,介绍负氢离子源的结构和工作过程,比较分析负氢离子的产生模式,着重对当前应用较多、具有应用前景的表面产生模式中负氢离子...负氢离子源已经成为核聚变装置中性束加热系统的首选离子源,中国的负氢离子源研究尚处于起步阶段。在本论文中,介绍负氢离子源的结构和工作过程,比较分析负氢离子的产生模式,着重对当前应用较多、具有应用前景的表面产生模式中负氢离子转化材料进行了介绍。掺铯的金属材料以其优异的特性成为当前负氢离子源的主要材料; La B6热阴极具有较好的负氢离子转化性能,但其复杂的结构和较短的寿命影响了其总体性能;高有序石墨仅仅在结构上具有一定的优势;结合热电子发射、场致电子发射和其他电子发射模式的金刚石膜材料具有较优异的性能预期和较好的前景。因此在未来的负氢离子源中,铯化金属材料和金刚石薄膜材料可能会成为用于表面转化的主要材料。展开更多
1 Introduction Ion sources with wide energy and current ranges are used extensively in industrial applications such as ion implantation, etching, and deposition. Broad beam ion sources with a uniform current distribu...1 Introduction Ion sources with wide energy and current ranges are used extensively in industrial applications such as ion implantation, etching, and deposition. Broad beam ion sources with a uniform current distributions are needed for many industrial applications and development of commercial ion bean technologies for surface modification of materials is impossible without highly efficient, simple, and dependable ion sources. These and other needs have spurred the development of high efficiency ion sources that can produce ion beams with high energy and current and require low or no maintenance.展开更多
基金Funded by Shenzhen-Hong Kong Innovative Collaborative Research and Development Program (Nos.SGLH20181109 110802117, CityU 9240014)Innovation Project of Southwestern Institute of Physics (Nos.202001XWCXYD002, 202301XWCX003)CNNC Young Talent Program (No.2023JZYF-01)。
文摘Surface metallization of glass fiber(GF)/polyetheretherketone(PEEK)[GF/PEEK] is conducted by coating copper using electroplating and magnetron sputtering and the properties are determined by X-ray diffraction(XRD), scanning electron microscopy(SEM), and electron backscatter diffraction(EBSD).The coating bonding strength is assessed by pull-out tests and scribing in accordance with GB/T 9286-1998.The results show that the Cu coating with a thickness of 30 μm deposited on GF/PEEK by magnetron sputtering has lower roughness, finer grain size, higher crystallinity, as well as better macroscopic compressive stress,bonding strength, and electrical conductivity than the Cu coating deposited by electroplating.
文摘负氢离子源已经成为核聚变装置中性束加热系统的首选离子源,中国的负氢离子源研究尚处于起步阶段。在本论文中,介绍负氢离子源的结构和工作过程,比较分析负氢离子的产生模式,着重对当前应用较多、具有应用前景的表面产生模式中负氢离子转化材料进行了介绍。掺铯的金属材料以其优异的特性成为当前负氢离子源的主要材料; La B6热阴极具有较好的负氢离子转化性能,但其复杂的结构和较短的寿命影响了其总体性能;高有序石墨仅仅在结构上具有一定的优势;结合热电子发射、场致电子发射和其他电子发射模式的金刚石膜材料具有较优异的性能预期和较好的前景。因此在未来的负氢离子源中,铯化金属材料和金刚石薄膜材料可能会成为用于表面转化的主要材料。
文摘1 Introduction Ion sources with wide energy and current ranges are used extensively in industrial applications such as ion implantation, etching, and deposition. Broad beam ion sources with a uniform current distributions are needed for many industrial applications and development of commercial ion bean technologies for surface modification of materials is impossible without highly efficient, simple, and dependable ion sources. These and other needs have spurred the development of high efficiency ion sources that can produce ion beams with high energy and current and require low or no maintenance.
基金National Natural Science Foundation of China(11875039,52173041)Innovation Program of SWIP(202102XWCXYD001)Sichuan Science and Technology Program(2019YFG0444)。
