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Influence of Zr(50)Cu(50) thin film metallic glass as buffer layer on the structural and optoelectrical properties of AZO films
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作者 Bao-Qing Zhang Gao-Peng Liu +4 位作者 Hai-Tao Zong Li-Ge Fu Zhi-Fei Wei Xiao-Wei Yang Guo-Hua Cao 《Chinese Physics B》 SCIE EI CAS CSCD 2020年第3期361-368,共8页
Aluminum-doped ZnO(AZO) thin films with thin film metallic glass of Zr(50)Cu(50) as buffer are prepared on glass substrates by the pulsed laser deposition. The influence of buffer thickness and substrate temperature o... Aluminum-doped ZnO(AZO) thin films with thin film metallic glass of Zr(50)Cu(50) as buffer are prepared on glass substrates by the pulsed laser deposition. The influence of buffer thickness and substrate temperature on structural, optical, and electrical properties of AZO thin film are investigated. Increasing the thickness of buffer layer and substrate temperature can both promote the transformation of AZO from amorphous to crystalline structure, while they show(100)and(002) unique preferential orientations, respectively. After inserting Zr(50)Cu(50) layer between the glass substrate and AZO film, the sheet resistance and visible transmittance decrease, but the infrared transmittance increases. With substrate temperature increasing from 25℃ to 520℃, the sheet resistance of AZO(100 nm)/Zr(50)Cu(50)(4 nm) film first increases and then decreases, and the infrared transmittance is improved. The AZO(100 nm)/Zr(50)Cu(50)(4 nm) film deposited at a substrate temperature of 360℃ exhibits a low sheet resistance of 26.7 ?/, high transmittance of 82.1% in the visible light region, 81.6% in near-infrared region, and low surface roughness of 0.85 nm, which are useful properties for their potential applications in tandem solar cell and infrared technology. 展开更多
关键词 aluminum-doped ZnO(azo) Zr(50)Cu(50) thin film METALLIC glass optoelectrical properties morphology
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调制周期数对Mo/AZO成分调制多层膜透光、反光特性以及电性能的影响
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作者 张邵奇 吴隽 +3 位作者 王凯丰 宋坤峰 卢志红 祝柏林 《武汉科技大学学报》 CAS 北大核心 2024年第2期107-113,共7页
采用射频(RF)和单极中频脉冲直流(UMFPDC)磁控溅射技术,在300℃下制备了Mo/AZO成分调制多层膜。测试结果表明,Mo/AZO成分调制多层膜以(002)为取向的六方纤锌矿型ZnO结构为主;薄膜中Mo的化学态随薄膜厚度而变化,当薄膜厚度为1.67 nm时,M... 采用射频(RF)和单极中频脉冲直流(UMFPDC)磁控溅射技术,在300℃下制备了Mo/AZO成分调制多层膜。测试结果表明,Mo/AZO成分调制多层膜以(002)为取向的六方纤锌矿型ZnO结构为主;薄膜中Mo的化学态随薄膜厚度而变化,当薄膜厚度为1.67 nm时,Mo除单质态外,还存在部分+4和+5的离子价态,当薄膜厚度降至0.83 nm时,已无单质态Mo;调制周期数对成分调制多层膜的透光、反光特性以及电性能影响显著,当调制周期数为3时,Mo/AZO成分调制多层膜的综合性能达到最佳,电阻率、霍尔迁移率和载流子浓度分别为8.64×10^(-4)Ω·cm、8.78 cm^2)/(V·s)和8.23×10^(20)cm^(-3)。在保持金属层、半导体层总厚度不变的情况下,通过改变调制周期数可以增加薄膜的光学透过率并可在较宽范围内调节多层膜的综合性能,这为制备综合性能优异的金属/半导体型透光导电薄膜提供了一条切实可行的途径。 展开更多
关键词 磁控溅射 Mo/azo多层膜 调制周期 光性能 电性能
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退火温度对ITO/Cu/AZO透明导电薄膜结构及性能的影响
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作者 孙冰成 张健 +1 位作者 张贤旺 于尉 《微纳电子技术》 CAS 2024年第11期155-162,共8页
采用射频与直流磁控交替溅射法在石英玻璃载玻片上制备了氧化铟锡(ITO)/Cu/Al掺杂ZnO(AZO)(45 nm/10 nm/45 nm)组合结构的透明导电薄膜,并在不同退火温度下对薄膜进行真空热处理。利用X射线衍射仪(XRD)、紫外-可见分光光度计、四探针电... 采用射频与直流磁控交替溅射法在石英玻璃载玻片上制备了氧化铟锡(ITO)/Cu/Al掺杂ZnO(AZO)(45 nm/10 nm/45 nm)组合结构的透明导电薄膜,并在不同退火温度下对薄膜进行真空热处理。利用X射线衍射仪(XRD)、紫外-可见分光光度计、四探针电阻测试仪等表征手段,系统地研究了退火温度对ITO/Cu/AZO复合薄膜晶体结构和光电性能的影响。结果显示,经过不同温度的真空退火处理,薄膜的晶体结构和导电性能得到显著改善和提高,薄膜可见光平均透过率随着退火温度的升高先增加后降低。对比发现,在气压5×10^(-3)Pa、温度150℃下退火制备的ITO/Cu/AZO结构薄膜表现出最佳的综合性能,薄膜具有较强的(222)和(440)晶面衍射峰,在400~800 nm光波范围平均透过率约为80.5%,电导率约为1.76×10^(3) S/cm,综合品质因数达到约2.12×10^(-3)/Ω。 展开更多
关键词 磁控溅射 真空热处理 氧化铟锡(ITO)薄膜 Al掺杂ZnO(azo)薄膜 交替溅射法
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Structural and optoelectronic properties of AZO thin films prepared by RF magnetron sputtering at room temperature 被引量:3
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作者 孙宜华 王海林 +2 位作者 陈剑 方亮 王磊 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2016年第6期1655-1662,共8页
Al-doped ZnO thin films were prepared on glass substrate using an ultra-high density target by RF magnetron sputtering at room temperature. The microstructure, surface morphology, optical and electrical properties of ... Al-doped ZnO thin films were prepared on glass substrate using an ultra-high density target by RF magnetron sputtering at room temperature. The microstructure, surface morphology, optical and electrical properties of AZO thin films were investigated by X-ray diffractometer, scanning electron microscope, UV-visible spectrophotometer, four-point probe method, and Hall-effect measurement system. The results showed that all the films obtained were polycrystalline with a hexagonal structure and average optical transmittance of AZO thin films was over 85 % at different sputtering powers. The sputtering power had a great effect on optoelectronic properties of the AZO thin films, especially on the resistivity. The lowest resistivity of 4.5×10^-4 Ω·cm combined with the transmittance of 87.1% was obtained at sputtering power of 200 W. The optical band gap varied between 3.48 and 3.68 eV. 展开更多
关键词 azo thin film microstructure optoelectronic properties RF magnetron sputtering
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Introduction of Ag nanoparticles by picosecond LIFT to improve the photoelectric property of AZO films 被引量:2
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作者 Xiaofang Xu Jingbo Li +2 位作者 Xiaohan Yang Sen Pan Yong Bi 《Chinese Optics Letters》 SCIE EI CAS CSCD 2020年第4期102-108,共7页
The photoelectric properties of conductive films are improved by doping Ag on aluminum-doped zinc oxide(AZO)films by laser induced forward transfer(LIFT).Firstly,the picosecond laser induced transfer mechanism of Ag f... The photoelectric properties of conductive films are improved by doping Ag on aluminum-doped zinc oxide(AZO)films by laser induced forward transfer(LIFT).Firstly,the picosecond laser induced transfer mechanism of Ag films was revealed by numerical simulation;then,different-thickness Ag films were deposited on the AZO films by picosecond LIFT.When the film thickness is 30 nm and,50 nm,we have successfully obtained some Ag-AZO films with better optoelectronic properties by adjusting the laser parameters. 展开更多
关键词 LIFT surface treatment azo film Ag-nanoparticles optoelectronic property
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基于AZO的光谱选择性反射膜制备及其在聚光器中的应用研究
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作者 王成龙 周渊 +1 位作者 王锐东 马军 《真空与低温》 2023年第1期20-27,共8页
铝掺杂氧化锌(AZO)薄膜在红外波段具有高反射率的特性。设计了SiO_(2)/AZO/Al_(2)O_(3)/Glass/SiO_(2)光谱选择性反射膜。通过软件仿真和实验研究,探究了SiO_(2)、AZO、Al_(2)O_(3)薄膜的光学常数以及物理厚度对SiO_(2)/AZO/Al_(2)O_(3)... 铝掺杂氧化锌(AZO)薄膜在红外波段具有高反射率的特性。设计了SiO_(2)/AZO/Al_(2)O_(3)/Glass/SiO_(2)光谱选择性反射膜。通过软件仿真和实验研究,探究了SiO_(2)、AZO、Al_(2)O_(3)薄膜的光学常数以及物理厚度对SiO_(2)/AZO/Al_(2)O_(3)/Glass/SiO_(2)薄膜光谱特性的影响,确定了光谱选择性反射薄膜的制备工艺参数。根据工艺制得了对可见光平均透射率接近90%、红外(2.5~20μm)平均反射率大于85%的光谱选择性反射膜,薄膜的辐射率为0.08~0.12。以表面镀有光谱选择性反射膜的玻璃作为线性菲涅尔式聚光系统中的二次聚光器窗口,设计了新型二次聚光器。光谱选择性反射玻璃有效阻挡了集热管的热辐射,使聚光器辐射热损失降低约66%。 展开更多
关键词 太阳能 光谱选择性反射膜 azo薄膜 辐射热损失 二次聚光器
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掺铝氧化锌(AZO)透明导电薄膜的研究进展 被引量:2
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作者 孔德茹 安佳钰 +1 位作者 刘靖 孙冬兰 《功能材料》 CAS CSCD 北大核心 2023年第9期9059-9069,共11页
新型掺铝氧化锌(AZO)透明导电薄膜光学性能优异,成本低廉,有望取代技术成熟的掺锡氧化铟(ITO)薄膜。主要简述了AZO薄膜的结构及其光电性能,重点综述了薄膜的制备工艺以及应用领域,对极具开发潜力的AZO薄膜的产业化前景进行了展望。
关键词 azo薄膜 特性 制备工艺 应用 产业化前景
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Enhancement of modulation depth of an all-optical switch using an azo dye-ethyl red film 被引量:1
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作者 陆文强 陈桂英 +3 位作者 郝召锋 许京军 田建国 张春平 《Chinese Physics B》 SCIE EI CAS CSCD 2010年第8期429-436,共8页
The polymethyl methacrylate (PMMA) film doped with an azo dye ethyl-red (ER) film is employed to demonstrate the properties of an all-optical switch by its photoinduced dichroism and birefringence. We show how to ... The polymethyl methacrylate (PMMA) film doped with an azo dye ethyl-red (ER) film is employed to demonstrate the properties of an all-optical switch by its photoinduced dichroism and birefringence. We show how to enhance remarkably the modulation depth of all-optical switches almost to 100% by using two linear polarization beams: one beam is inclined at 45° with respect to the probing beam and serves as a pumping beam, and the other beam is perpendicular to the probing beam and used as an erasing beam. Furthermore, a maximum-to-minimum output intensity ratio of 2000:1 is achieved in experiment, which is very useful and important for optical storages and image displays. 展开更多
关键词 all-optical switch azo dye ethyl-red film modulation depth
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柔性AZO/Cu/AZO/CTO薄膜的太阳阻隔及红外隐身性能的研究
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作者 程露路 孙可为 +3 位作者 尹洪峰 袁蝴蝶 杨春利 魏英 《功能材料》 CAS CSCD 北大核心 2023年第10期10149-10154,共6页
采用磁控溅射的方法在PET衬底上制备了AZO/Cu/AZO/CTO薄膜,系统研究了CTO(CeO_(2)-TiO_(2))层厚度对AZO/Cu/AZO/CTO薄膜的微观结构、光学性能、红外发射率和导电性的影响。结果表明,随着CTO层厚度的增加,多层膜的带隙变窄,紫外阻隔率和... 采用磁控溅射的方法在PET衬底上制备了AZO/Cu/AZO/CTO薄膜,系统研究了CTO(CeO_(2)-TiO_(2))层厚度对AZO/Cu/AZO/CTO薄膜的微观结构、光学性能、红外发射率和导电性的影响。结果表明,随着CTO层厚度的增加,多层膜的带隙变窄,紫外阻隔率和近红外阻隔率提高,可见光透过率降低。同时,CTO层有利于降低多层膜的表面电阻和红外发射率。当CTO层厚度为34.2 nm时,多层膜的紫外阻隔率为92.0%,近红外阻隔率为46.5%,可见光透过率为62.5%,8~14μm红外发射率为0.163,因此AZO/Cu/AZO/CTO薄膜具有光谱选择性和低的红外发射率,是一种有潜力的太阳阻隔膜和红外隐身材料。 展开更多
关键词 azo/Cu/azo 磁控溅射 太阳阻隔膜 红外隐身 红外发射率
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柔性AZO/NiCr/Ag/NiCr/AZO透明导电玻璃结构对性能的影响
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作者 姚婷婷 王天齐 +3 位作者 王伟 汪冰洁 李刚 甘治平 《表面技术》 EI CAS CSCD 北大核心 2023年第12期449-455,共7页
目的室温制备柔性透明导电玻璃并提高其光电性能。方法采用直流磁控溅射法,以柔性玻璃为基底,在室温下沉积(Aluminum-doped ZnO,AZO)/NiCr/Ag/NiCr/AZO多层结构透明导电玻璃。通过探针轮廓仪测试、X射线衍射仪(X-ray diffraction,XRD)... 目的室温制备柔性透明导电玻璃并提高其光电性能。方法采用直流磁控溅射法,以柔性玻璃为基底,在室温下沉积(Aluminum-doped ZnO,AZO)/NiCr/Ag/NiCr/AZO多层结构透明导电玻璃。通过探针轮廓仪测试、X射线衍射仪(X-ray diffraction,XRD)测试、拉曼光谱仪测试、分光光度计测量、四探针测试和霍尔效应测试,分别获得了样品的各层薄膜厚度、X射线衍射图谱、拉曼光谱、透光率、方块电阻和电学性能。经过参数优化,选取Ag膜厚度为3~15 nm的样品,研究Ag膜厚度对玻璃样品的结构特征及光电性能的影响。结果样品光电性能与Ag层厚度密切相关,随着中间Ag层厚度的增加,样品在380~760 nm波长范围内的平均光透光率先增加后降低,吸收边依次发生了红移,样品的方块电阻则随着Ag层厚度的增加单调减小。Ag膜厚度为12 nm的样品综合光电性能最佳,其平均透光率为82.4%,载流子浓度为8.32×10^(21) cm^(‒3),载流子迁移率为8.21 cm^(2)/(V·s),电阻率为9.15×10^(‒5)Ω·cm,方块电阻为8.8Ω/sq,品质因子可达16.4×10^(–3)Ω^(–1)。结论说明可以通过透明导电薄膜结合金属薄膜在室温下获得柔性透明导电玻璃,并具有较好的透光性能和导电性。 展开更多
关键词 柔性 透明导电玻璃 azo/NiCr/Ag/NiCr/azo Ag厚度 透光率 品质因子
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Effect of Oxygen Partial Pressure on Epitaxial Growth and Properties of Laser-Ablated AZO Thin Films
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作者 王传彬 LUO Sijun +1 位作者 SHEN Qiang 张联盟 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2016年第1期27-30,共4页
Al-doped ZnO(AZO) thin films were grown on c-sapphire substrates by laser ablation under different oxygen partial pressures(P_(O2)).The effect of P_(O2) on the crystal structure,preferred orientation as well a... Al-doped ZnO(AZO) thin films were grown on c-sapphire substrates by laser ablation under different oxygen partial pressures(P_(O2)).The effect of P_(O2) on the crystal structure,preferred orientation as well as the electrical and optical properties of the films was investigated.The structure characterizations indicated that the as-grown films were single-phased with a wurtzite ZnO structure,showing a significant c-axis orientation.The films were well crystallized and exhibited better crystallinity and denser texture when deposited at higher P_(O2).At the optimum oxygen partial pressures of 10- 15 Pa,the AZO thin films were epitaxially grown on c-sapphire substrates with the(0001) plane parallel to the substrate surface,i e,the epitaxial relationship was AZO(000 1) // A1_2O_3(000 1).With increasing P_(O2),the value of Hall carrier mobility was increased remarkably while that of carrier concentration was decreased slightly,which led to an enhancement in electrical conductivity of the AZO thin films.All the films were highly transparent with an optical transmittance higher than 85%. 展开更多
关键词 azo thin films epitaxial growth laser ablation oxygen partial pressure electrical and optical properties
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A new inorganic azo dye and its thin film:MoO_4N_4H_6
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作者 Ì.Afsin Kariper 《International Journal of Minerals,Metallurgy and Materials》 SCIE EI CAS CSCD 2014年第5期510-514,共5页
Thin films of hydrazine molybdenum (MoO4N4H6), a new inorganic azo dye, were synthesized and deposited on a commercial glass substrate using the chemical bath deposition technique. Subsequently, the optical transmis... Thin films of hydrazine molybdenum (MoO4N4H6), a new inorganic azo dye, were synthesized and deposited on a commercial glass substrate using the chemical bath deposition technique. Subsequently, the optical transmission, reflectivity, absorption, refractive index, and dielectric constant of hydrazine molybdenum were investigated using an ultraviolet-visible spectrophotometer. In addition, the film structure was analyzed by mid-infrared spectroscopy. The spectra of the films were found to be in line with those in the literature. The surface properties of all films were examined using a computer-controlled digital scanning electron microscope with a secondary electron detector. The areas of application and the technological advantages of this material were also considered. 展开更多
关键词 azo dyes thin films HYDRAZINE MOLYBDENUM optical properties dielectric properties
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Brightness of Blue/Violet Luminescent Nano-Crystalline AZO and IZO Thin Films with Effect of Layer Number:For High Optical Performance
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作者 Panagiota KORAL Songül FAT VAROL +1 位作者 Michael KOMPITSAS Mihaela GIRTAN 《Chinese Physics Letters》 SCIE CAS CSCD 2016年第5期80-83,共4页
From different reports, it (AZO) and indium-doped including usage areas. We nanocrystalline films with is realized that there is a need to consider all sides of aluminum-doped zinc oxide zinc oxide (IZO) thin film... From different reports, it (AZO) and indium-doped including usage areas. We nanocrystalline films with is realized that there is a need to consider all sides of aluminum-doped zinc oxide zinc oxide (IZO) thin films with their optical, luminescence and surface properties establish an assessment to carry out further information to summarize AZO and IZO impact of the layer number. 展开更多
关键词 of in is azo ZnO Brightness of Blue/Violet Luminescent Nano-Crystalline azo and IZO Thin films with Effect of Layer Number:For High Optical Performance for that with
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6AZO-CONTAINING SELF-ASSEMBLY ULTRA-THIN FILMS AND THEIR PHOTOVOLTAIC PROPERTIES
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作者 Mao-fengZhang Qiao-hongYao +1 位作者 Chun-huiHuang Wei-xiaoCao 《Chinese Journal of Polymer Science》 SCIE CAS CSCD 2005年第1期23-27,共5页
A kind of azo-containing resin(Azo-R)was synthesized by a simple way through the coupling reaction of 2-nitro-N-methyldiphenylamine-4-diazoresin(NDR)with phenol,and a new covalentely attached multilayer film from Azo-... A kind of azo-containing resin(Azo-R)was synthesized by a simple way through the coupling reaction of 2-nitro-N-methyldiphenylamine-4-diazoresin(NDR)with phenol,and a new covalentely attached multilayer film from Azo-R asH-donor and photosensitive diazoresin,diphenylamine-4-diazoresin(DR)as H-acceptor via H-bonding attraction by self-assembly technique has been fabricated.Following the decomposition of diazonium group of DR under exposure to UVlight,the H-bonds between the layers of the film convert to covalent bonds and the film becomes very stable toward polarsolvents or electrolyte aqueous solutions.Thus the UV-irradiated azo-containing films can be used to measure photocurrentin a conventional three-electrode photoelectrochemical cell using KCl as supporting electrolyte.It was confirmed that theazo-containing multilayer film is responsible for the photocurrent generation. 展开更多
关键词 azo-containing resin Self-assembly film Photovoltaic property.
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本底真空度对磁控溅射法制备AZO薄膜的影响 被引量:10
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作者 霍红英 邹敏 +1 位作者 马光强 常会 《表面技术》 EI CAS CSCD 北大核心 2013年第1期75-77,共3页
采用直流磁控溅射方法在平板玻璃基体表面沉积AZO薄膜,研究了本底真空度对薄膜厚度、方块电阻以及在300~1100 nm波长范围内透过率的影响。结果表明:薄膜的方块电阻和透过率随本底真空度的提高而降低,厚度随本底真空度的提高而增加;本... 采用直流磁控溅射方法在平板玻璃基体表面沉积AZO薄膜,研究了本底真空度对薄膜厚度、方块电阻以及在300~1100 nm波长范围内透过率的影响。结果表明:薄膜的方块电阻和透过率随本底真空度的提高而降低,厚度随本底真空度的提高而增加;本底真空度较低时,其变化对薄膜的厚度、方块电阻和透过率的影响较大,随着本底真空度的增加,影响程度逐渐降低。 展开更多
关键词 磁控溅射 azo薄膜 本底真空度
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AZO透明导电薄膜的特性、制备与应用 被引量:38
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作者 范志新 陈玖琳 孙以材 《真空》 CAS 北大核心 2000年第5期10-13,共4页
本文综述了 AZO透明导电薄膜的结构特点 ,电学和光学的特性 ,薄膜研究、应用和开发现状 。
关键词 特性 制备 应用 azo 掺铝氧化锌 透明导电薄膜
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快速退火对直流磁控溅射法制备的AZO薄膜性能的影响 被引量:6
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作者 姜丽莉 辛艳青 +3 位作者 宋淑梅 杨田林 李延辉 韩圣浩 《真空科学与技术学报》 EI CAS CSCD 北大核心 2010年第3期302-305,共4页
在室温下,采用直流磁控溅射方法制备了不同厚度的氧化锌掺铝薄膜,并对样品进行了快速退火处理,退火温度为600℃,时间为60 s。研究了退火前后薄膜的结构、光电特性的变化情况。退火后,薄膜的最小电阻率为4.2×10-4Ω.cm,其透过率为90... 在室温下,采用直流磁控溅射方法制备了不同厚度的氧化锌掺铝薄膜,并对样品进行了快速退火处理,退火温度为600℃,时间为60 s。研究了退火前后薄膜的结构、光电特性的变化情况。退火后,薄膜的最小电阻率为4.2×10-4Ω.cm,其透过率为90.1%。禁带宽度由退火前的3.68 eV变为3.75 eV。 展开更多
关键词 快速退火 直流磁控溅射 azo薄膜 光电特性禁带宽度
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射频溅射功率对AZO薄膜结构及光电特性和热稳定性的影响 被引量:8
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作者 马晓翠 叶家聪 +4 位作者 曹培江 柳文军 贾芳 朱德亮 吕有明 《发光学报》 EI CAS CSCD 北大核心 2010年第2期235-238,共4页
采用射频磁控溅射法,在玻璃基片上制备了ZnO:Al(AZO)透明导电薄膜。用X射线衍射(XRD)仪、紫外-可见分光光度计、方块电阻测试仪和台阶仪对不同溅射功率下Al掺杂ZnO薄膜的结晶、光学、电学性能、沉积速率以及热稳定性进行了研究。研究结... 采用射频磁控溅射法,在玻璃基片上制备了ZnO:Al(AZO)透明导电薄膜。用X射线衍射(XRD)仪、紫外-可见分光光度计、方块电阻测试仪和台阶仪对不同溅射功率下Al掺杂ZnO薄膜的结晶、光学、电学性能、沉积速率以及热稳定性进行了研究。研究结果表明:不同溅射功率下沉积的AZO薄膜具有六角纤锌矿结构,均呈c轴择优取向;(002)衍射峰强和薄膜的结晶度随溅射功率的提高逐渐增强;随溅射功率的提高,AZO薄膜的透射率有所下降,但在可见光(380~780nm)范围内平均透射率仍>80%;薄膜的方块电阻随溅射功率的增加逐渐减小;功率为160~200W时,薄膜的热稳定性最好,升温前后方块电阻变化率为13%。 展开更多
关键词 磁控溅射 azo薄膜 射频功率 热稳定性
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Al浓度对AZO薄膜结构和光电性能的影响 被引量:6
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作者 李金丽 邓宏 +2 位作者 刘财坤 袁庆亮 韦敏 《功能材料》 EI CAS CSCD 北大核心 2007年第1期91-92,96,共3页
采用射频溅射方法在Si基片上制备出AZO掺杂薄膜,对薄膜进行了XRD和AFM分析,并对其电性能作了研究。结果表明,掺杂量低于15%(原子分数)时,AZO薄膜结构为纤锌矿结构,呈c轴方向择优生长,没有Al2O3相出现。薄膜的可见光透过率均在80%以上,... 采用射频溅射方法在Si基片上制备出AZO掺杂薄膜,对薄膜进行了XRD和AFM分析,并对其电性能作了研究。结果表明,掺杂量低于15%(原子分数)时,AZO薄膜结构为纤锌矿结构,呈c轴方向择优生长,没有Al2O3相出现。薄膜的可见光透过率均在80%以上,其最高电阻率出现在掺杂量为30%(原子分数),为1.3×107Ω.cm。 展开更多
关键词 azo薄膜 X射线衍射 AFM 电阻率
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AZO薄膜双靶PLD沉积及其光学性能分析 被引量:5
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作者 胡少六 江超 +1 位作者 龙华 王又青 《压电与声光》 CAS CSCD 北大核心 2004年第2期119-121,共3页
介绍了利用锌靶和铝靶在氧气气氛中进行掺铝氧化锌(AZO)透明导电薄膜的脉冲激光沉积(PLD)新方法,并与利用ZnO陶瓷靶沉积AZO薄膜的方法进行了对比,分析了此方法的优势和特点。描述了利用该方法在玻璃和硅片上沉积AZO薄膜的实验过程。通... 介绍了利用锌靶和铝靶在氧气气氛中进行掺铝氧化锌(AZO)透明导电薄膜的脉冲激光沉积(PLD)新方法,并与利用ZnO陶瓷靶沉积AZO薄膜的方法进行了对比,分析了此方法的优势和特点。描述了利用该方法在玻璃和硅片上沉积AZO薄膜的实验过程。通过透射光谱分析了沉积的透明导电膜在可见光区的透射性能,用X-射线衍射谱(XRD)研究了薄膜的结构。 展开更多
关键词 脉冲激光沉积 azo薄膜 双靶
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