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Structural and optoelectronic properties of AZO thin films prepared by RF magnetron sputtering at room temperature 被引量:3
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作者 孙宜华 王海林 +2 位作者 陈剑 方亮 王磊 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2016年第6期1655-1662,共8页
Al-doped ZnO thin films were prepared on glass substrate using an ultra-high density target by RF magnetron sputtering at room temperature. The microstructure, surface morphology, optical and electrical properties of ... Al-doped ZnO thin films were prepared on glass substrate using an ultra-high density target by RF magnetron sputtering at room temperature. The microstructure, surface morphology, optical and electrical properties of AZO thin films were investigated by X-ray diffractometer, scanning electron microscope, UV-visible spectrophotometer, four-point probe method, and Hall-effect measurement system. The results showed that all the films obtained were polycrystalline with a hexagonal structure and average optical transmittance of AZO thin films was over 85 % at different sputtering powers. The sputtering power had a great effect on optoelectronic properties of the AZO thin films, especially on the resistivity. The lowest resistivity of 4.5×10^-4 Ω·cm combined with the transmittance of 87.1% was obtained at sputtering power of 200 W. The optical band gap varied between 3.48 and 3.68 eV. 展开更多
关键词 azo thin film microstructure optoelectronic properties RF magnetron sputtering
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Effect of Oxygen Partial Pressure on Epitaxial Growth and Properties of Laser-Ablated AZO Thin Films
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作者 王传彬 LUO Sijun +1 位作者 SHEN Qiang 张联盟 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2016年第1期27-30,共4页
Al-doped ZnO(AZO) thin films were grown on c-sapphire substrates by laser ablation under different oxygen partial pressures(P_(O2)).The effect of P_(O2) on the crystal structure,preferred orientation as well a... Al-doped ZnO(AZO) thin films were grown on c-sapphire substrates by laser ablation under different oxygen partial pressures(P_(O2)).The effect of P_(O2) on the crystal structure,preferred orientation as well as the electrical and optical properties of the films was investigated.The structure characterizations indicated that the as-grown films were single-phased with a wurtzite ZnO structure,showing a significant c-axis orientation.The films were well crystallized and exhibited better crystallinity and denser texture when deposited at higher P_(O2).At the optimum oxygen partial pressures of 10- 15 Pa,the AZO thin films were epitaxially grown on c-sapphire substrates with the(0001) plane parallel to the substrate surface,i e,the epitaxial relationship was AZO(000 1) // A1_2O_3(000 1).With increasing P_(O2),the value of Hall carrier mobility was increased remarkably while that of carrier concentration was decreased slightly,which led to an enhancement in electrical conductivity of the AZO thin films.All the films were highly transparent with an optical transmittance higher than 85%. 展开更多
关键词 azo thin films epitaxial growth laser ablation oxygen partial pressure electrical and optical properties
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A new inorganic azo dye and its thin film:MoO_4N_4H_6
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作者 Ì.Afsin Kariper 《International Journal of Minerals,Metallurgy and Materials》 SCIE EI CAS CSCD 2014年第5期510-514,共5页
Thin films of hydrazine molybdenum (MoO4N4H6), a new inorganic azo dye, were synthesized and deposited on a commercial glass substrate using the chemical bath deposition technique. Subsequently, the optical transmis... Thin films of hydrazine molybdenum (MoO4N4H6), a new inorganic azo dye, were synthesized and deposited on a commercial glass substrate using the chemical bath deposition technique. Subsequently, the optical transmission, reflectivity, absorption, refractive index, and dielectric constant of hydrazine molybdenum were investigated using an ultraviolet-visible spectrophotometer. In addition, the film structure was analyzed by mid-infrared spectroscopy. The spectra of the films were found to be in line with those in the literature. The surface properties of all films were examined using a computer-controlled digital scanning electron microscope with a secondary electron detector. The areas of application and the technological advantages of this material were also considered. 展开更多
关键词 azo dyes thin films HYDRAZINE MOLYBDENUM optical properties dielectric properties
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Influence of Zr(50)Cu(50) thin film metallic glass as buffer layer on the structural and optoelectrical properties of AZO films
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作者 Bao-Qing Zhang Gao-Peng Liu +4 位作者 Hai-Tao Zong Li-Ge Fu Zhi-Fei Wei Xiao-Wei Yang Guo-Hua Cao 《Chinese Physics B》 SCIE EI CAS CSCD 2020年第3期361-368,共8页
Aluminum-doped ZnO(AZO) thin films with thin film metallic glass of Zr(50)Cu(50) as buffer are prepared on glass substrates by the pulsed laser deposition. The influence of buffer thickness and substrate temperature o... Aluminum-doped ZnO(AZO) thin films with thin film metallic glass of Zr(50)Cu(50) as buffer are prepared on glass substrates by the pulsed laser deposition. The influence of buffer thickness and substrate temperature on structural, optical, and electrical properties of AZO thin film are investigated. Increasing the thickness of buffer layer and substrate temperature can both promote the transformation of AZO from amorphous to crystalline structure, while they show(100)and(002) unique preferential orientations, respectively. After inserting Zr(50)Cu(50) layer between the glass substrate and AZO film, the sheet resistance and visible transmittance decrease, but the infrared transmittance increases. With substrate temperature increasing from 25℃ to 520℃, the sheet resistance of AZO(100 nm)/Zr(50)Cu(50)(4 nm) film first increases and then decreases, and the infrared transmittance is improved. The AZO(100 nm)/Zr(50)Cu(50)(4 nm) film deposited at a substrate temperature of 360℃ exhibits a low sheet resistance of 26.7 ?/, high transmittance of 82.1% in the visible light region, 81.6% in near-infrared region, and low surface roughness of 0.85 nm, which are useful properties for their potential applications in tandem solar cell and infrared technology. 展开更多
关键词 aluminum-doped ZnO(azo) Zr(50)Cu(50) thin film METALLIC glass optoelectrical properties morphology
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Effect of annealing treatment on the structural, optical, and electrical properties of Al-doped ZnO thin films 被引量:11
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作者 LI Li FANG Liang +5 位作者 CHEN Ximing LIU Gaobin LIU Jun YANG Fengfan FU Guangzong KONG Chunyang 《Rare Metals》 SCIE EI CAS CSCD 2007年第3期247-253,共7页
Highly conductive and transparent Al-doped ZnO (AZO) thin films were prepared from a zinc target containing Al (1.5 wt.%) by direct current (DC) and radio frequency (RF) reactive magnetron sputtering. The stru... Highly conductive and transparent Al-doped ZnO (AZO) thin films were prepared from a zinc target containing Al (1.5 wt.%) by direct current (DC) and radio frequency (RF) reactive magnetron sputtering. The structural, optical, and electrical properties of AZO films as-deposited and submitted to annealing treatment (at 300 and 400℃, respectively) were characterized using various techniques. The experimental results show that the properties of AZO thin films can be further improved by annealing treatment. The crystallinity of ZnO films improves after annealing treatment. The transmittances of the AZO thin films prepared by DC and RF reactive magnetron sputtering are up to 80% and 85% in the visible region, respectively. The electrical resistivity of AZO thin films prepared by DC reactive magnetron sputtering can be as low as 8.06 x 10-4 Ωcm after annealing treatment. It was also found that AZO thin films prepared by RF reactive magnetron sputtering have better structural and optical properties than that prepared by DC reactive magnetron sputtering. 展开更多
关键词 azo thin films structure optical and electrical properties ANNEALING transmittance spectra electrical resistivity
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Effect of substrate rotation speed on structure and properties of Al-doped ZnO thin films prepared by rf-sputtering
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作者 E.A.MARTíN-TOVAR L.G.DAZA +2 位作者 A.J.R.LóPEZ-ARREGUíN A.IRIBARREN R.CASTRO-RODRIGUEZ 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2017年第9期2055-2062,共8页
Al-doped ZnO(AZO)thin films were deposited on glass substrates by rf-sputtering at room temperature.The effects of substrate rotation speed(ωS)on the morphological,structural,optical and electrical properties were in... Al-doped ZnO(AZO)thin films were deposited on glass substrates by rf-sputtering at room temperature.The effects of substrate rotation speed(ωS)on the morphological,structural,optical and electrical properties were investigated.SEM transversal images show that the substrate rotation produces dense columnar structures which were found to be better defined under substrate rotation.AFM images show that the surface particles of the samples formed under substrate rotation are smaller and denser than those of a stationary one,leading to smaller grain sizes.XRD results show that all films have hexagonal wurtzite structure and preferred c-axis orientation with a tensile stress along the c-axis.The average optical transmittance was above90%in UV-Vis region.The lowest resistivity value(8.5×10?3Ω·cm)was achieved atωS=0r/min,with a carrier concentration of1.8×1020cm?3,and a Hall mobility of4.19cm2/(V·s).For all other samples,the substrate rotation induced changes in the carrier concentration and Hall mobility which resulted in the increasing of electrical resistivity.These results indicate that the morphology,structure,optical and electrical properties of the AZO thin films are strongly affected by the substrate rotation speed. 展开更多
关键词 azo thin film rf-magnetron sputtering microstructure optoelectronic properties substrate rotation speed
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掺铝氧化锌(AZO)透明导电薄膜的研究进展 被引量:2
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作者 孔德茹 安佳钰 +1 位作者 刘靖 孙冬兰 《功能材料》 CAS CSCD 北大核心 2023年第9期9059-9069,共11页
新型掺铝氧化锌(AZO)透明导电薄膜光学性能优异,成本低廉,有望取代技术成熟的掺锡氧化铟(ITO)薄膜。主要简述了AZO薄膜的结构及其光电性能,重点综述了薄膜的制备工艺以及应用领域,对极具开发潜力的AZO薄膜的产业化前景进行了展望。
关键词 azo薄膜 特性 制备工艺 应用 产业化前景
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Photovoltaic properties of Cu_2O-based heterojunction solar cells using n-type oxide semiconductor nano thin films prepared by low damage magnetron sputtering method 被引量:1
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作者 Toshihiro Miyata Kyosuke Watanabe +1 位作者 Hiroki Tokunaga Tadatsugu Minami 《Journal of Semiconductors》 EI CAS CSCD 2019年第3期29-32,共4页
We improved the photovoltaic properties of Cu_2O-based heterojunction solar cells using n-type oxide semiconductor thin films prepared by a sputtering apparatus with our newly developed multi-chamber system. We also o... We improved the photovoltaic properties of Cu_2O-based heterojunction solar cells using n-type oxide semiconductor thin films prepared by a sputtering apparatus with our newly developed multi-chamber system. We also obtained the highest efficiency(3.21%) in an AZO/p-Cu_2O heterojunction solar cell prepared with optimized pre-sputtering conditions using our newly developed multi-chamber sputtering system. This value achieves the same or higher characteristics than AZO/Cu_2O solar cells with a similar structure prepared by the pulse laser deposition method. 展开更多
关键词 CU2O azo solar cell oxide thin film MAGNETRON SPUTTERING
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Effects of Electropulsing Induced Microstructural Changes on THz-Reflection and Electrical Conductivity of Al-Doped ZnO Thin-Films
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作者 Yaohua Zhu Weien Lai 《Journal of Surface Engineered Materials and Advanced Technology》 2016年第3期106-117,共13页
Electropulsing induced phase transformation and crystal orientation change and their effects on electrical conductivity, THz reflection and surface roughness of thin-films of Al<sub>2</sub>O<sub>3<... Electropulsing induced phase transformation and crystal orientation change and their effects on electrical conductivity, THz reflection and surface roughness of thin-films of Al<sub>2</sub>O<sub>3</sub> (2 wt%) doped ZnO were studied using XRD, SEM, AFM and Thz spectroscopy techniques. AZO-2 thin-films showed an effective response in THz spectroscopy under electropulsing. Electropulsing induced circular preferred crystal orientation changes and phase transformations were observed. The preferred crystal orientation changes accompanying decrease in stress and the secondary phase precipitation favored enhancing conductivity and THz reflection of the AZO-2 thin-films. After adequate electropulsing, both THz reflection and electrical conductivity of the thin-films were enhanced by 22.8% and 6.8%, respectively;meanwhile surface roughness reduced. The property responses of electropulsing are discussed from point view of microstructural change and dislocation dynamics. 展开更多
关键词 ELECTROPULSING PRECIPITATION Preferred Crystal Orientation THz Reflection Electrical Conductivity azo thin-films
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磁控溅射法制备AZO薄膜的工艺研究 被引量:15
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作者 张丽伟 卢景霄 +5 位作者 段启亮 王海燕 李瑞 靳锐敏 王红娟 张宇翔 《电子元件与材料》 CAS CSCD 北大核心 2005年第8期46-48,共3页
用XRD测试仪、分光光度计、四探针等测试仪器,探讨了制备气氛、退火温度和退火环境对AZO薄膜光电性能及结构的影响。结果表明:氧气和氩气的体积流量比为2∶1时,薄膜透光率最高(95.33%);退火有利于薄膜结晶;低于400℃退火时,温度越高薄... 用XRD测试仪、分光光度计、四探针等测试仪器,探讨了制备气氛、退火温度和退火环境对AZO薄膜光电性能及结构的影响。结果表明:氧气和氩气的体积流量比为2∶1时,薄膜透光率最高(95.33%);退火有利于薄膜结晶;低于400℃退火时,温度越高薄膜电阻越小,超过400℃后,真空中退火温度再升高电阻变化不大,而空气中退火温度再升高电阻反而变大。 展开更多
关键词 无机非金属材料 azo薄膜 磁控溅射法 制备气氛 退火温度
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射频溅射功率对AZO薄膜结构及光电特性和热稳定性的影响 被引量:8
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作者 马晓翠 叶家聪 +4 位作者 曹培江 柳文军 贾芳 朱德亮 吕有明 《发光学报》 EI CAS CSCD 北大核心 2010年第2期235-238,共4页
采用射频磁控溅射法,在玻璃基片上制备了ZnO:Al(AZO)透明导电薄膜。用X射线衍射(XRD)仪、紫外-可见分光光度计、方块电阻测试仪和台阶仪对不同溅射功率下Al掺杂ZnO薄膜的结晶、光学、电学性能、沉积速率以及热稳定性进行了研究。研究结... 采用射频磁控溅射法,在玻璃基片上制备了ZnO:Al(AZO)透明导电薄膜。用X射线衍射(XRD)仪、紫外-可见分光光度计、方块电阻测试仪和台阶仪对不同溅射功率下Al掺杂ZnO薄膜的结晶、光学、电学性能、沉积速率以及热稳定性进行了研究。研究结果表明:不同溅射功率下沉积的AZO薄膜具有六角纤锌矿结构,均呈c轴择优取向;(002)衍射峰强和薄膜的结晶度随溅射功率的提高逐渐增强;随溅射功率的提高,AZO薄膜的透射率有所下降,但在可见光(380~780nm)范围内平均透射率仍>80%;薄膜的方块电阻随溅射功率的增加逐渐减小;功率为160~200W时,薄膜的热稳定性最好,升温前后方块电阻变化率为13%。 展开更多
关键词 磁控溅射 azo薄膜 射频功率 热稳定性
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AZO透明导电薄膜的特性、制备与应用 被引量:38
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作者 范志新 陈玖琳 孙以材 《真空》 CAS 北大核心 2000年第5期10-13,共4页
本文综述了 AZO透明导电薄膜的结构特点 ,电学和光学的特性 ,薄膜研究、应用和开发现状 。
关键词 特性 制备 应用 azo 掺铝氧化锌 透明导电薄膜
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Al浓度对AZO薄膜结构和光电性能的影响 被引量:6
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作者 李金丽 邓宏 +2 位作者 刘财坤 袁庆亮 韦敏 《功能材料》 EI CAS CSCD 北大核心 2007年第1期91-92,96,共3页
采用射频溅射方法在Si基片上制备出AZO掺杂薄膜,对薄膜进行了XRD和AFM分析,并对其电性能作了研究。结果表明,掺杂量低于15%(原子分数)时,AZO薄膜结构为纤锌矿结构,呈c轴方向择优生长,没有Al2O3相出现。薄膜的可见光透过率均在80%以上,... 采用射频溅射方法在Si基片上制备出AZO掺杂薄膜,对薄膜进行了XRD和AFM分析,并对其电性能作了研究。结果表明,掺杂量低于15%(原子分数)时,AZO薄膜结构为纤锌矿结构,呈c轴方向择优生长,没有Al2O3相出现。薄膜的可见光透过率均在80%以上,其最高电阻率出现在掺杂量为30%(原子分数),为1.3×107Ω.cm。 展开更多
关键词 azo薄膜 X射线衍射 AFM 电阻率
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射频溅射工艺参数对AZO薄膜结构和性能的影响 被引量:5
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作者 黄稳 余洲 +4 位作者 刘连 张勇 黄涛 闫勇 赵勇 《功能材料》 EI CAS CSCD 北大核心 2012年第12期1553-1555,1560,共4页
采用射频磁控溅射法制备了掺铝氧化锌(AZO)薄膜,研究了衬底温度及溅射工作压强对沉积薄膜的晶体结构、表面形貌及电学性能的影响。结果显示,随衬底温度增加,薄膜的结晶结构发生显著变化,而溅射工作气压增加主要影响沉积薄膜(103)面与(0... 采用射频磁控溅射法制备了掺铝氧化锌(AZO)薄膜,研究了衬底温度及溅射工作压强对沉积薄膜的晶体结构、表面形貌及电学性能的影响。结果显示,随衬底温度增加,薄膜的结晶结构发生显著变化,而溅射工作气压增加主要影响沉积薄膜(103)面与(002)面的相对强度。薄膜的表面形貌受温度影响严重,而气压对形貌的影响相对较小。衬底温度增加,薄膜的电阻率急剧降低,迁移率和载流子浓度都显著增加,而工作气压增加则导致电阻率先减小后增大。 展开更多
关键词 azo薄膜 晶体结构 电学性能
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薄膜厚度和工作压强对室温制备AZO薄膜性能的影响 被引量:6
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作者 张俊双 叶勤 +1 位作者 曾富强 王权康 《材料导报》 EI CAS CSCD 北大核心 2011年第12期45-48,共4页
采用射频磁控溅射法在室温下、普通玻璃基片上制备了AZO透明导电薄膜。用X射线衍射仪、原子力显微镜、紫外-可见分光光度计和四探针测量了不同薄膜厚度和不同工作压强下所得样品的结构、电学和光学性能,结果表明,所制备的AZO薄膜均具有... 采用射频磁控溅射法在室温下、普通玻璃基片上制备了AZO透明导电薄膜。用X射线衍射仪、原子力显微镜、紫外-可见分光光度计和四探针测量了不同薄膜厚度和不同工作压强下所得样品的结构、电学和光学性能,结果表明,所制备的AZO薄膜均具有六角纤锌矿结构,沿c轴择优取向生长;在可见光范围内,薄膜平均透过率约为80%;随着薄膜厚度的增加和工作压强的降低,薄膜的电阻率呈下降趋势;得到的薄膜最低方块电阻为7.5Ω/□。 展开更多
关键词 磁控溅射 azo导电薄膜 薄膜厚度 工作压强 光电性能
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工作气压对室温溅射柔性AZO薄膜性能的影响 被引量:4
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作者 张惠 沈鸿烈 +2 位作者 鲁林峰 江丰 冯晓梅 《功能材料》 EI CAS CSCD 北大核心 2010年第7期1154-1157,共4页
采用射频磁控溅射法在PEN衬底上室温制备了AZO薄膜,并对不同工作气压下(0.05~0.4Pa)沉积薄膜的结构及光电性能进行了研究。结果表明,薄膜具有良好的c轴择优取向,随工作气压增大,薄膜(002)峰强度减弱,晶粒减小,表面粗糙度增大,电学性能... 采用射频磁控溅射法在PEN衬底上室温制备了AZO薄膜,并对不同工作气压下(0.05~0.4Pa)沉积薄膜的结构及光电性能进行了研究。结果表明,薄膜具有良好的c轴择优取向,随工作气压增大,薄膜(002)峰强度减弱,晶粒减小,表面粗糙度增大,电学性能下降,薄膜可见光透过率变化不大,但禁带宽度变窄。与玻璃衬底相比,PEN衬底上沉积的AZO薄膜拥有更高的品质因数,获得的最佳电阻率、载流子浓度和霍尔迁移率分别为1.11×10-3Ω.cm、4.14×1020cm-3和13.60cm2/(V.s),该薄膜可见光的绝对透射率达到95.7%。 展开更多
关键词 azo薄膜 磁控溅射 工作气压 PEN衬底
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重掺杂AZO透明导电薄膜的光电特性 被引量:4
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作者 吕有明 曹培江 +5 位作者 贾芳 柳文军 朱德亮 马晓翠 林传强 刘稳 《发光学报》 EI CAS CSCD 北大核心 2011年第4期307-312,共6页
以Al质量分数为2%的ZnO陶瓷靶为靶材,在氧气气氛中,采用脉冲激光沉积方法(PLD)在石英衬底表面生长了重掺杂的ZnO∶Al(AZO)薄膜。通过X射线衍射仪、紫外可见分光光度计、微区拉曼光谱仪、霍尔测量仪对合成薄膜材料的晶体结构、光学、电... 以Al质量分数为2%的ZnO陶瓷靶为靶材,在氧气气氛中,采用脉冲激光沉积方法(PLD)在石英衬底表面生长了重掺杂的ZnO∶Al(AZO)薄膜。通过X射线衍射仪、紫外可见分光光度计、微区拉曼光谱仪、霍尔测量仪对合成薄膜材料的晶体结构、光学、电学性质等进行了研究。结果表明:所制备的AZO薄膜呈现具有高度c轴择优取向的ZnO纤锌矿结构;重掺杂下的AZO显示了简并半导体的性质,电学呈现出了类金属特性;在可见光区域透过率>80%,吸收边和紫外发光峰出现了明显的蓝移现象,被归结为重掺杂下引起的Burstein-Moss效应导致光学带隙展宽。 展开更多
关键词 azo薄膜 Burstein-Moss效应 光电特性
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真空退火法对AZO薄膜的研究 被引量:5
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作者 张丽伟 王子健 +3 位作者 卢景霄 王海燕 吴芳 李红菊 《真空》 CAS 北大核心 2006年第5期13-15,共3页
磁控溅射法在玻璃衬底上制备了AZO(氧化锌掺铝)薄膜。对薄膜进行了真空退火。利用XRD、分光光度计以及四探针等测试装置,对AZO薄膜的晶粒度、透光率和导电性能进行了测试分析。结果表明,退火有利于薄膜结晶;退火有利于薄膜光电性能的提... 磁控溅射法在玻璃衬底上制备了AZO(氧化锌掺铝)薄膜。对薄膜进行了真空退火。利用XRD、分光光度计以及四探针等测试装置,对AZO薄膜的晶粒度、透光率和导电性能进行了测试分析。结果表明,退火有利于薄膜结晶;退火有利于薄膜光电性能的提高。在本实验中,AZO薄膜的最高透光率可达90.617%;最低电阻率可达2.21×10-3(Ω.cm)。对比在真空中退火的ITO薄膜的光电性能参数,结果已有所超越。此结果说明,AZO薄膜有潜力成为透明导电膜ITO的替代产品。 展开更多
关键词 磁控溅射法 azo薄膜 退火 光电特性 透过率
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磁控溅射AZO透明导电薄膜及其光电性能的研究 被引量:7
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作者 赵斌 唐立丹 +1 位作者 梅海林 王冰 《电子元件与材料》 CAS CSCD 2015年第8期38-41,共4页
采用磁控溅射法在石英玻璃衬底上制备AZO薄膜。利用X射线衍射仪、原子力显微镜、四探针测试仪和透射光谱仪等手段研究了衬底温度对AZO薄膜结构、形貌、光电性能的影响。结果表明,所有的AZO薄膜均为纤锌矿结构且具有较好的c轴取向。薄膜... 采用磁控溅射法在石英玻璃衬底上制备AZO薄膜。利用X射线衍射仪、原子力显微镜、四探针测试仪和透射光谱仪等手段研究了衬底温度对AZO薄膜结构、形貌、光电性能的影响。结果表明,所有的AZO薄膜均为纤锌矿结构且具有较好的c轴取向。薄膜表面平整,晶粒约为55.56 nm。随着衬底温度升高,薄膜电阻率先降低而后升高,当衬底温度为350℃时,电阻率最小,约为1.41×10–3?·cm,而且该薄膜具有较好的透光率,约为84%。 展开更多
关键词 azo薄膜 磁控溅射 衬底温度 结构特性 电阻率 透光率
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AZO透明导电薄膜的结构与光电性能 被引量:8
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作者 李金丽 邓宏 刘财坤 《电子元件与材料》 CAS CSCD 北大核心 2007年第1期43-45,共3页
采用射频溅射工艺制备了Zn1-xAlxO透明导电薄膜。通过XRD、UV透射和电学性能测试等分析手段,研究了Al浓度对薄膜的组织结构和光电性能的影响规律。结果表明:薄膜具有c轴择优取向,随着Al浓度的增加,(002)衍射峰向高角度移动,峰强度逐渐减... 采用射频溅射工艺制备了Zn1-xAlxO透明导电薄膜。通过XRD、UV透射和电学性能测试等分析手段,研究了Al浓度对薄膜的组织结构和光电性能的影响规律。结果表明:薄膜具有c轴择优取向,随着Al浓度的增加,(002)衍射峰向高角度移动,峰强度逐渐减弱,x(Al)为15%掺杂极限浓度。x(Al)为2%时,薄膜电阻率是3.4×10–4Ω.cm。随着掺杂量x(Al)从0增加到20%,薄膜的禁带宽度从3.34 eV增加到4.0 eV。 展开更多
关键词 无机非金属材料 azo薄膜 组织结构 光电性能
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