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Plasma-nitriding of tantalum at relatively low temperature
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作者 ZHANGDeyuan LINQin +2 位作者 ZHAOHaomin FEIQinyong GENGMan 《Rare Metals》 SCIE EI CAS CSCD 2004年第2期185-188,共4页
The combined quadratic orthogonal regression method of experiment design wasemployed to explore the effects of process parameters of plasma nitriding of tantalum such as totalpressure, temperature and original hydroge... The combined quadratic orthogonal regression method of experiment design wasemployed to explore the effects of process parameters of plasma nitriding of tantalum such as totalpressure, temperature and original hydrogen molar fraction on the hardness, roughness and structureof nitriding surfaces. The regression equations of hardness, roughness and structure were givenaccording to the results of regression and statistic analysis. And the diffusion activation energyof nitrogen in tantalum on plasma nitriding conditions was calculated according to the experimentaldata of hardness of plasma-nitriding of tantalum vs time and temperature. The diffusion activationenergy calculated belongs to (155.49 +- 10.51) kJ/mol (783-983 K). 展开更多
关键词 surface and interface of materials plasma nitriding orthogonal regressionmethod TANTALUM
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