Diamond-like carbon (DLC) films have been deposited on glass substrates usingradio-frequency (rf) plasma deposition method. Gamma -ray, ultraviolet (UV) ray were used toirradiate the DLC films. Raman spectroscopy and ...Diamond-like carbon (DLC) films have been deposited on glass substrates usingradio-frequency (rf) plasma deposition method. Gamma -ray, ultraviolet (UV) ray were used toirradiate the DLC films. Raman spectroscopy and infrared (IR) spectroscopy were use to characterizethe changing characteristics of SP^3 C-H bond and hydrogen content in the films due to theirradiations. The results show that, the damage degrees induced by the UV ray on the SP^3 C-H bondsare much stronger than that by the gamma -ray. When the irradiation dose of gamma -ray reaches 1 OX10^4 Gy, the SP^3 C-H bond reduces about 50 percent in number. The square electrical resistance ofthe films is reduced due to the irradiation of UV ray and this is caused by severe oxidation of thefilms. By using the results on optical gap of the films and the fully constrained network theory,the hydrogen content in the as-deposited films is estimated to be l0-25at. percent.展开更多
基金This research was supported by the Aeronautics Science Foundation of China (No.98G51124).
文摘Diamond-like carbon (DLC) films have been deposited on glass substrates usingradio-frequency (rf) plasma deposition method. Gamma -ray, ultraviolet (UV) ray were used toirradiate the DLC films. Raman spectroscopy and infrared (IR) spectroscopy were use to characterizethe changing characteristics of SP^3 C-H bond and hydrogen content in the films due to theirradiations. The results show that, the damage degrees induced by the UV ray on the SP^3 C-H bondsare much stronger than that by the gamma -ray. When the irradiation dose of gamma -ray reaches 1 OX10^4 Gy, the SP^3 C-H bond reduces about 50 percent in number. The square electrical resistance ofthe films is reduced due to the irradiation of UV ray and this is caused by severe oxidation of thefilms. By using the results on optical gap of the films and the fully constrained network theory,the hydrogen content in the as-deposited films is estimated to be l0-25at. percent.
