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Optimization of Plasma Etching Parameters and Mask for Silica Optical Waveguides 被引量:1
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作者 周立兵 刘文 吴国阳 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2005年第6期1104-1110,共7页
Optical waveguides in silica-on-silicon are one of the key elements in optical communications.The processes of deep etching silica waveguides using resist and metal masks in RIE plasma are investigated.The etching res... Optical waveguides in silica-on-silicon are one of the key elements in optical communications.The processes of deep etching silica waveguides using resist and metal masks in RIE plasma are investigated.The etching responses,including etching rate and selectivity as functions of variation of parameters,are modeled with a 3D neural network.A novel resist/metal combined mask that can overcome the single-layer masks’ limitations is developed for enhancing the waveguides deep etching and low-loss optical waveguides are fabricated at last. 展开更多
关键词 reactive ion etching silica-on-silicon optical waveguides 3D neural network
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