Based on site studies, historical literature investigation and academic communication, this work aims to dig out the cultural significance in architectural and religious aspects conveyed in cliff carvings in the Bashu...Based on site studies, historical literature investigation and academic communication, this work aims to dig out the cultural significance in architectural and religious aspects conveyed in cliff carvings in the Bashu region. After casting a glance at the origin and evolution of Bashu culture and religion mainly involving Daoism and Buddhism recorded in forms of cliff carvings, we concentrated on discovering the national, regional and folk architectural characters implicated in cliff carvings at different sites within the Bashu region. The cliff carvings in this region vividly depicted the evolution of the architectural culture hereof. The essence of their religious and architectural connotations can be good stuff to be input in today’s architectural design philosophy.展开更多
An experimental study of the dependence of SiO2 waveguide side wall roughness on the etch condi- tions and etch masks in CHF3/O2 based reactive ion etching plasma was reported. When working under standard low-pressure...An experimental study of the dependence of SiO2 waveguide side wall roughness on the etch condi- tions and etch masks in CHF3/O2 based reactive ion etching plasma was reported. When working under standard low-pressure （20mtorr） etching conditions, a novel etch roughening phenomenon has been observed in the plasma, that is, the roughness of the etched front surface increases with the amount of material etched, independent of etch rate, RF power, and gas composition. Besides, the etched underlying side wall will be tapered as the upper SU-8 resist pattern degradation transfers downward. A process using double-layered mask, consisting of SU-8 resist and thin Chromium film, was developed for improving the side wall smoothness. Based on the studies, SiO2/Si channel waveguides with the propagation loss less than 0. 07dB/cm were fabricated at last.展开更多
基金Funded by China Postdoctoral Science Foundation (No. 2005037548).
文摘Based on site studies, historical literature investigation and academic communication, this work aims to dig out the cultural significance in architectural and religious aspects conveyed in cliff carvings in the Bashu region. After casting a glance at the origin and evolution of Bashu culture and religion mainly involving Daoism and Buddhism recorded in forms of cliff carvings, we concentrated on discovering the national, regional and folk architectural characters implicated in cliff carvings at different sites within the Bashu region. The cliff carvings in this region vividly depicted the evolution of the architectural culture hereof. The essence of their religious and architectural connotations can be good stuff to be input in today’s architectural design philosophy.
文摘An experimental study of the dependence of SiO2 waveguide side wall roughness on the etch condi- tions and etch masks in CHF3/O2 based reactive ion etching plasma was reported. When working under standard low-pressure （20mtorr） etching conditions, a novel etch roughening phenomenon has been observed in the plasma, that is, the roughness of the etched front surface increases with the amount of material etched, independent of etch rate, RF power, and gas composition. Besides, the etched underlying side wall will be tapered as the upper SU-8 resist pattern degradation transfers downward. A process using double-layered mask, consisting of SU-8 resist and thin Chromium film, was developed for improving the side wall smoothness. Based on the studies, SiO2/Si channel waveguides with the propagation loss less than 0. 07dB/cm were fabricated at last.
