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Fabrication and Evaluation of Bragg Gratings on Optimally Designed Silicon-on-Insulator Rib Waveguides Using Electron-Beam Lithography
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作者 武志刚 张伟刚 +5 位作者 王志 开桂云 袁树中 董孝义 宇高胜之 和田恭雄 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2006年第8期1347-1350,共4页
The fabrication of Bragg gratings on silicon-on-insulator (SOI) rib waveguides using electron-beam lithography is presented. The grating waveguide is optimally designed for actual photonic integration. Experimental ... The fabrication of Bragg gratings on silicon-on-insulator (SOI) rib waveguides using electron-beam lithography is presented. The grating waveguide is optimally designed for actual photonic integration. Experimental and theoretical evaluations of the Bragg grating are demonstrated. By thinning the SOl device layer and deeply etching the Bragg grating, a large grating coupling coefficient of 30cm^-1 is obtained. 展开更多
关键词 integrated optics Bragg grating SILICON-ON-INSULATOR rib waveguide
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