Surface Patterning of Metal Zinc Electrode with an In‑Region Zincophilic Interface for High‑Rate and Long‑Cycle‑Life Zinc Metal Anode

The undesirable dendrite growth induced by non-planar zinc(Zn)deposition and low Coulombic efficiency resulting from severe side reactions have been long-standing challenges for metallic Zn anodes and substantially impede the practical application of rechargeable aqueous Zn metal batteries(ZMBs).Herein,we present a strategy for achieving a high-rate and long-cycle-life Zn metal anode by patterning Zn foil surfaces and endowing a Zn-Indium(Zn-In)interface in the microchannels.The accumulation of electrons in the microchannel and the zincophilicity of the Zn-In interface promote preferential heteroepitaxial Zn deposition in the microchannel region and enhance the tolerance of the electrode at high current densities.Meanwhile,electron aggregation accelerates the dissolution of non-(002)plane Zn atoms on the array surface,thereby directing the subsequent homoepitaxial Zn deposition on the array surface.Consequently,the planar dendrite-free Zn deposition and long-term cycling stability are achieved(5,050 h at 10.0 mA cm^(−2) and 27,000 cycles at 20.0 mA cm^(−2)).Furthermore,a Zn/I_(2) full cell assembled by pairing with such an anode can maintain good stability for 3,500 cycles at 5.0 C,demonstrating the application potential of the as-prepared ZnIn anode for high-performance aqueous ZMBs.

Recent Advances in Patterning Strategies for Full‑Color Perovskite Light‑Emitting Diodes

Metal halide perovskites have emerged as promising light-emitting materials for next-generation displays owing to their remarkable material characteristics including broad color tunability,pure color emission with remarkably narrow bandwidths,high quantum yield,and solution processability.Despite recent advances have pushed the luminance efficiency of monochromic perovskite light-emitting diodes(PeLEDs)to their theoretical limits,their current fabrication using the spincoating process poses limitations for fabrication of full-color displays.To integrate PeLEDs into full-color display panels,it is crucial to pattern red–green–blue(RGB)perovskite pixels,while mitigating issues such as cross-contamination and reductions in luminous efficiency.Herein,we present state-of-the-art patterning technologies for the development of full-color PeLEDs.First,we highlight recent advances in the development of efficient PeLEDs.Second,we discuss various patterning techniques of MPHs(i.e.,photolithography,inkjet printing,electron beam lithography and laserassisted lithography,electrohydrodynamic jet printing,thermal evaporation,and transfer printing)for fabrication of RGB pixelated displays.These patterning techniques can be classified into two distinct approaches:in situ crystallization patterning using perovskite precursors and patterning of colloidal perovskite nanocrystals.This review highlights advancements and limitations in patterning techniques for PeLEDs,paving the way for integrating PeLEDs into full-color panels.

Dissolvable temporary barrier:a novel paradigm for flexible hydrogel patterning in organ-on-a-chip models

A combination of hydrogels and microfluidics allows the construction of biomimetic three-dimensional(3D)tissue models in vitro,which are also known as organ-on-a-chipmodels.The hydrogel patterningwith awell-controlled spatial distribution is typically achieved by embedding sophisticated microstructures to act as a boundary.However,these physical barriers inevitably expose cells/tissues to a less physiologically relevant microenvironment than in vivo conditions.Herein,we present a novel dissolvable temporary barrier(DTB)strategy that allows robust and flexible hydrogel patterning with great freedom of design and desirable flow stimuli for cellular hydrogels.The key aspect of this approach is the patterning of a water-soluble rigid barrier as a guiding path for the hydrogel using stencil printing technology,followed by a barrier-free medium perfusion after the dissolution of the DTB.Single and multiple tissue compartments with different geometries can be established using either straight or curved DTB structures.The effectiveness of this strategy is further validated by generating a 3D vascular network through vasculogenesis and angiogenesis using a vascularized microtumor model.As a new proof-of-concept in vasculature-on-a-chip,DTB enables seamless contact between the hydrogel and the culture medium in closed microdevices,which is an improved protocol for the fabrication ofmultiorgan chips.Therefore,we expect it to serve as a promising paradigm for organ-on-a-chip devices for the development of tumor vascularization and drug evaluation in the future preclinical studies.

Study on the Mechanism of Nanopatterning in Printed Electronics Based on Molecular Dynamics Simulation

In order to research the feasibility of using the selective adsorption principle to achieve automatic shaping of nano patterns,in this study,using the liquid gallium as the conductive ink and graphene as the printing plate surface,by changing the surface wettability of patterned areas on the nanoscale of graphene printed boards,the automatic formation of liquid gallium patterns on the graphene printed plate surface was simulated.The results indicated that liquid gallium can achieve automatic patterning on the surface of graphene patterned areas;the greater the interaction energy between gallium and carbon atoms,the clearer the pattern;gallium liquid is prone to remain in complex local positions of the pattern,making it difficult to shape the pattern;if the spacing between adjacent pattern lines is too large or too small,it will result in residual gallium liquid between the lines;increasing the thickness of the gallium film will cause the pattern to expand beyond the boundary,but increasing the thickness of the gallium film can also enhance the thickness and uniformity of the pattern lines.In summary,the principle of selective adsorption can be used to achieve the automatic formation of nano patterns,and the pattern formation effect is influenced by factors such as atomic interaction energy and pattern configuration.

Patterning mechanisms controlling digit development

Vertebrate digits are essential structures for movement, feeding and communication. Specialized regions of the developing limb bud including the zone of polarizing activity （ZPA）, the apical ectodermal ridge （AER）, and the non-ridge ectoderm regulate the patterning of digits. Although a series of signaling molecules have been characterized as patterning signals from the organizing centers, the delicate cellular and molecular mechanisms that interpret how these patterning signals control the detailed digit anatomy remain unclear, Recent studies from model organisms and human hand malformations provide new insights into the mechanisms regulating this process. Here, we review the current understanding of the genetic networks governing digit morphogenesis

Advanced tufted carpet patterning technology

After a review of the tufting industry’s development, and a brief introduction to available systems for producing patterned tufted carpets, the principle of ICN (Individually Controlled Needle) and the related advanced tufting technology Col-ortec are presented. Finally, Colortec machine, Axminster weaving machine, and Wilton loom are compared. It is believed that the Cobble Colortec machine is a significant jump forward in the tufted carpets industry as it now allows access to all major carpet markets in a competitive fashion.

Patterning of Metal Halide Perovskite Thin Films and Functional Layers for Optoelectronic Applications

In recent years,metal halide perovskites have received significant attention as materials for next-generation optoelectronic devices owing to their excellent optoelectronic properties.The unprecedented rapid evolution in the device performance has been achieved by gaining an advanced understanding of the composition,crystal growth,and defect engineering of perovskites.As device performances approach their theoretical limits,effective optical management becomes essential for achieving higher efficiency.In this review,we discuss the status and perspectives of nano to micron-scale patterning methods for the optical management of perovskite optoelectronic devices.We initially discuss the importance of effective light harvesting and light outcoupling via optical management.Subsequently,the recent progress in various patterning/texturing techniques applied to perovskite optoelectronic devices is summarized by categorizing them into top-down and bottom-up methods.Finally,we discuss the perspectives of advanced patterning/texturing technologies for the development and commercialization of perovskite optoelectronic devices.

Wing patterning genes of Nilaparvata lugens identification by transcriptome analysis, and their differential expression profile in wing pads between brachypterous and macropterous morphs

The brown planthopper, Nilaparvata lugens is an economically important pest on rice plants. This species produces macropterous and brachypterous morphs in response to environmental cues, which makes it very dififcult to control. The molecular basis of wing patterning in N. lugens is stil unknown. It is necessary to identify wing patterning genes of N. lugens, and also to clarify the expression differences of wing patterning genes between macropterous and brachypter-ous morphs. High-throughput deep sequencing of transcriptome of N. lugens wing pad yielded 116 744 580 raw reads and 113 042 700 clean reads. Al the reads were assembled into 55 963 unigenes with an average length of 804 bp. With the E-value cut-off of 1.0E–5,18 359 and 2 883 unigens had hits in NCBI-NR (NCBI non-redundant protein sequences) and NCBI-NT (NCBI nucleotide sequences) databases, respectively. A total of 16 502 unigenes were assigned to GO (gene ontology) classiifcation, 9 709 ungenes were grouped into 26 COG (cluster of orthologous groups of proteins) classiifcations, and 6 724 unigenes were assigned to different KEGG (Kyoto encyclopedia of genes and genomes) path-ways. In total, 56 unigenes which are homologous to wing patterning genes of Drosophila melanogaster or Tribolium castaneum were identiifed. Out of the 56 unigenes, 24 unigenes were selected, and their expression levels across the ifve nymphal stages between macropterous strain and brachypterous strain were examined by qRT-PCR. Two-way ANOVA analysis showed that development stage had signiifcant effects on the expression level of al the 24 genes (P<0.05). The expression levels of 8 genes (Nlen, Nlhh, Nlsal, NlAbd-A, Nlwg, Nlvg, Nlexd and NlUbx) were signiifcantly affected by wing morph. This is the ifrst transcriptome analysis of wing pads of hemimetabolous insect, N. lugens. The identiifed wing patterning genes would be useful resource for future exploration of molecular basis of wing development. The 8 differential y expressed wing patterning genes between macropterous strain and brachypterous strain would contribute to explain molecular mechanism of wing-morph differentiation in N. lugens.

Direct laser interference patterning of nonvolatile magnetic nanostructures in Fe60Al40 alloy via disorder‐induced ferromagnetism

Current magnetic memories are based on writing and reading out the domains with opposite orientation of the magnetization vector.Alternatively,information can be encoded in regions with a different value of the saturation magnetization.The latter approach can be realized in principle with chemical order-disorder transitions in intermetallic alloys.Here,we study such transformations in a thin-film(35 nm)Fe60Al40 alloy and demonstrate the formation of periodic magnetic nanostructures(PMNS)on its surface by direct laser interference patterning(DLIP).These PMNS are nonvolatile and detectable by magnetic force microscopy(MFM)at room temperature after DLIP with a single nanosecond pulse.We provide different arguments that the PMNS we observe originate from increasing magnetization in maxima of the interference pattern because of chemical disordering in the atomic lattice of the alloy at temperatures T higher than the critical temperature Tc for the order(B2)-disorder(A2)transition.Theoretically,our simulations of the temporal evolution of a partially ordered state at T>Tc reveal that the disordering rate is significant even below the melting threshold.Experimentally,we find that the PMNS are erasable with standard thermal annealing at T<Tc.

Xenopus Tbx6 mediates posterior patterning via activation of Wnt and FGF signalling

In vertebrates, the patterning of anterior-posterior （AP） axis is a fundamental process during embryogenesis. Wnt and FGF signalling pathways play important roles in regulating the patterning of embryo AP axis. Mouse Tbx6 encodes a transcription factor that has been demonstrated to be involved in the specification of the posterior tissue in mouse embryonic body. Here, we prove that morpholino-induced knockdown of XTbx6 impairs posterior development, indicating the requirement of XTbx6 in this process. Meanwhile, gain of XTbx6 function is sufficient to induce ectopic posterior structures in Xenopus embryos. Furthermore, XTbx6 activates the expression of Xwnt8 and FGF8, which are two mediators of posterior development, suggesting a mechanism by which XTbx6 modulates posterior patterning via Wnt and FGF signalling pathway activation.

G-G PATTERNING METHOD OF SILK WEAVING IN EARLIER CHINA

There are some unique techniques in the Chinese traditional silk production. 2-2 patterning method is such one suggested by foreign scholars. But this paper gives a more extensive concept, G-G method, which includes the 2-2 method after studying more fabrics from the Shang. to the Five Dynasties. Finally, the paper discusses the truth of G-G method the (?) applied in, and some characteristics of G-G method.

Nanometer scale patterning of ultrathin films with a scanning tunneling microscope in ambient environment

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Peri-Ocular Eye Patterning (POEP): More than Meets the Eye

Spatial body patterning is widely observed throughout the phylogenetic tree and is used for a variety of functions. Body colours in general and camouflaging patterns in particular have been extensively studied for their role in stealth and crypsis. Particular interest has focused on the diverse skin patterns surrounding animals’ eyes (Peri-Ocular Eye Patterning-POEP). These patterns have been suggested to aid in high brightness conditions, help camouflage an organism’s eyes or ornament and emphasize bright head colorations. In this work I demonstrate the apparent widespread use of POEP among various marine and terrestrial organisms (both vertebrates and invertebrates) and discuss the trait’s abundance, variations, and possible roles.

Innovation on Line Cut Methods of Self-aligned Multiple Patterning

Self-aligned multiple patterning (SAMP) can enable the semiconductor scaling before EUV lithography becomes mature for industry use.Theoretically any small size of pitch can be achieved by repeating SADP on same wafer but with challenges of pitch walking and line cut since line cut has to be done by lithography instead of self-aligned method.Line cut can become an issue at sub-30nm pitch due to edge placement error (EPE).In this paper we will discuss some recent novel ideas on line cut after self-aligned multiple patterning.

Patterning Technology of Ferrite and Insulating Material in a Single Layer of the Multilayer Ceramic Device

Patterning technology of ferrite and insulating material in multilayer ceramic devices is proposed. In the conventional technology, the different ceramic materials such as the ferrite and the insulating material have been prepared in the form of the each different green sheet, and then they have been stacked each other. Otherwise the different material has filled cavities that were formed by a mechanical punching in advanced. In our proposing technology, arbitrary patterning of the different ceramic material inside the same green sheet is possible. In this process, the arbitrary shape of the through pattern is formed in the green sheet of the base material by making use of photo resist films as sacrifice patterns, and then the base material is masked by the patterned photo resist film. After filling the slurry of the different material into the through pattern of the base material passing the resist mask, the pattern of the different ceramic material in the green sheet is achieved. In the present paper, the ferrite magnetic material and the alumina-glass composite material are used. The patterned structure inside the green sheet is obtained. The slurry preparation, the thickness of the mask resist film, and the obtained structure of the green sheet are discussed.

The Morphology of Patterning with Pseudoplastic Metal Nanoparticle Fluids during Heat Treatment

A pseudoplastic metal nanoparticle fluid （PMNF） is used in nanoimprint to fabricate semiconductors and func- tional devices. The evaporation of the solvent and the sintering of the Au PMNF are investigated. The key parameters, which influence the morphology of patterning, such as the radius of metal particles, the concentra- tion of metal particles, the Hamaker constant of the solvent, viscosity of the fluids and the evaporation velocity, are analyzed. Based on a two-sphere sintering model, the equations are derived, which represent the relationships between the relative shrinkage and radius of the metal particles, sintering temperature and time. The optimal parameters for the heat treatment are provided in nanoimprint.

Au maskless patterning for vacuum packaging using the electrochemical method

The interconnection of wires is an important issue in vacuum-packaged microelectromechanical systems devices because of the difficulties of hermetical sealing and electrical insulation.This paper presents an approach of Au film selective patterning on highly uneven surfaces for wire interconnections of devices in which silicon-oninsulator(SOI)wafers are anodically bonded to glass.The Au film on the handle layer,functioned as an anode,was selectively removed with electrochemical dissolution in a chloride solution.The choice of etchant solution and etching conditions were optimized to improve the process efficiency,resulting in a high yield of gold portions within the via holes for wire interconnection.The proposed wire interconnection technology was employed to fabricate a vacuum-packaged resonant pressure sensor as a proof-of-concept demonstration.Reliable wire bonding and vacuum package were achieved as well as a Q factor that does not decrease over a year.As a platform technology,this method provides a new approach of wire interconnection for vacuum-packaged devices based on SOI–glass anodic bonding.

Patterning Defect Study for Process Integration Engineering Using Pattern Fidelity Monitoring with Review SEM Images

Normally the optical wafer inspection tools are used for advanced process control in high volume manufacturing of semiconductor devices. The SEM Review is done for limited sample of inspection defects to do defect based process characterization. The defect classes that are monitored normally indicate process and random defect issues. There is limited to no information of patterning related issues in real time defect monitor. Moreover, with the objective of process integration engineering of multiple processes it becomes harder to see the evolution of a defect in the line. The Die-to-Database Pattern Monitor (D2DB-PM) solution has addressed this problem. It uses the existing high resolution images from the Review and Metrology tools and compares the pattern shapes with the design reference. This way it captures patterning deviations in real time. Here we report the subtle defect problem encountered in process integration and the results from using the D2DB-PM solution. We found that this approach reduces the workload on CDSEM tools by analyzing SEM Review images instead and the automated reports improves the efficiency of all process teams.

Research progress of quantum dot photolithography patterning and direct photolithography application

For the new display technology based on quantum dots(QDs),realizing high-precision arrays of red,green,and blue(RGB)pixels has been a significant research focus at present,aimed at achieving high-quality and high-resolution image displays.However,challenges such as material stability and the variability of process environments complicate the assurance of quality in high-precision patterns.The novel optical patterning technology,exemplified by direct photolithography,is considered a highly promising approach for achieving submicron-level,hyperfine patterning.On the technological level,this method produces patterned quantum dot light-emitting films through a photochemical reaction.Here,we provide a comprehensive review of various methods of QD photolithography patterning,including traditional photolithography,lift off,and direct photolithography,which mainly focused on direct photolithography.This review covers the classification of direct photolithography technologies,summarizes the latest research progress,and discusses future perspectives on the advancement of photolithography technology de-masking.