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Corrosion behavior of tantalum and its nitride in alkali solution 被引量:1
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作者 ZHANGDeyuan LINQin +3 位作者 FEIQinyong ZHAOHaomin KANGGuangyu GENGMan 《Rare Metals》 SCIE EI CAS CSCD 2003年第4期276-279,共4页
The corrosion behavior of tantalum and its nitrides in stirring NaOHsolutions was researched by potentiostatic method, cyclic voltammetry and XPS. The results showedthat the corrosion products were composed of Ta_2O_5... The corrosion behavior of tantalum and its nitrides in stirring NaOHsolutions was researched by potentiostatic method, cyclic voltammetry and XPS. The results showedthat the corrosion products were composed of Ta_2O_5 and NaTaO_3. The corrosion reaction formula oftantalum and its nitrides was written according to cyclic volt-ampere curves. The electric chargetransfer coefficient and the electric charge transfer number were calculated 展开更多
关键词 surface and interface of materials CORROSION ELECTROCHEMISTRY TANTALUM NITRIDE
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Plasma-nitriding of tantalum at relatively low temperature
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作者 ZHANGDeyuan LINQin +2 位作者 ZHAOHaomin FEIQinyong GENGMan 《Rare Metals》 SCIE EI CAS CSCD 2004年第2期185-188,共4页
The combined quadratic orthogonal regression method of experiment design wasemployed to explore the effects of process parameters of plasma nitriding of tantalum such as totalpressure, temperature and original hydroge... The combined quadratic orthogonal regression method of experiment design wasemployed to explore the effects of process parameters of plasma nitriding of tantalum such as totalpressure, temperature and original hydrogen molar fraction on the hardness, roughness and structureof nitriding surfaces. The regression equations of hardness, roughness and structure were givenaccording to the results of regression and statistic analysis. And the diffusion activation energyof nitrogen in tantalum on plasma nitriding conditions was calculated according to the experimentaldata of hardness of plasma-nitriding of tantalum vs time and temperature. The diffusion activationenergy calculated belongs to (155.49 +- 10.51) kJ/mol (783-983 K). 展开更多
关键词 surface and interface of materials plasma nitriding orthogonal regressionmethod TANTALUM
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