First Report of a Postharvest Fruit Rot on Apple Caused by <i>Diaporthe phaseolorum</i>var. <i>caulivora</i>in China: A Note

Brown rots of Red Fuji apples were observed in Hangzhou city (Zhengjiang Province, China). The causal agent was isolated and identified in both morphological and molecular genetic levels. The phenotype and phylogenetic analysis revealed that the isolate was Diaporthe phaseolorum var. caulivora, and its pathogenicity on apple fruit was confirmed by re-inoculation experiment. To our knowledge, this is the first report of D. phaseolorum var. caulivora causing postharvest fruit rot on apple in China.

A Study of the Major Pathogens Causing Fruit Rots of Apple in Shelf Life in Hangzhou, Zhejiang Province, China

Major pathogens causing fruit rots of apple in shelf life in Hangzhou, a city in east China, were identified by rDNA-ITS analysis. Their pathogenicities and stress tolerances were compared as well. Combining with disease symptoms, colonial phenotypes and mycelial microscopic morphology, the fungi were determined as Penicillium expansum, Botrytis cinerea, Botryosphaeria dothidea, Diaporthe phaseolorum, Alternaria alternata and Fusarium acuminatum, respectively. Among them, B. cinerea and B. dothidea showed a higher pathogenicity;B. cinerea and D. phaseolorum were hardly affected by the temperature at a range of 15°C and 25°C;B. cinerea has the highest resistant to Thiabendazole and D. phaseolorum displayed the strongest resistance to Imazalil;and P. expansum was most sensitive to ultraviolet light radiation. The results provide some useful information that helps to combine conventional and alternative control strategies to minimize apple postharvest losses in shelf life.

Synthesis of Magnetic Metal-Semiconductor Hybrid Nanocrystals with Controlled Morphologies for Photocatalytic Applications

Metal-semiconductor hybrid nanocrystals have received intensive research interests because of their multiple functionalities which can be applied in wide fields such as photocatalysis,solar energy utilization,electronic devices and biomedical sensing.In the photocatalytic applications。

氧空位提升锂离子电池富锂锰基正极分级多孔微米球的高倍率性能（英文）

富锂锰基正极材料存在首次库仑效率低、倍率性能差以及电压衰减严重等问题,极大地限制了其规模化应用.本文通过在富锂锰基分级多孔微米球的表面构筑氧空位(L@S)成功抑制了首次放电过程中不可逆Li_2O的形成,有效促进了Li^+离子的扩散动力学,从而提高了电极材料的结构稳定性.研究结果表明,L@S正极在0.1 C电流密度下循环的首次库仑效率高达92.3%,放电比容量为292.6 mA h g^-1;在10 C大电流密度下循环100圈后可逆比容量为222 mAhg^-1,容量保持率为95.7%.进一步增大电流密度至20 C时,循环100圈后L@S正极的放电比容量仍高达153 mAh g^-1此外,匹配Li4Ti5012负极组装的全电池在3 C电流密度下循环400圈后的可逆比容量为141 mAh g^-1,电压保持率高达97%.

再循环抗体的研究进展

单克隆抗体因其与抗原结合具有高度特异性与强亲和力,已成为抗体药物研发的主要类型。但随着天然单克隆抗体的深入研究,它的诸多缺陷也浮出水面,如与抗原结合次数有限、带来非预期的抗体清除效应和抗原累积效应。人们不再局限于天然抗体的筛选,而是想通过改造提升抗体药物的药效。近年来,一类新型再循环抗体的问世,很好地解决了天然单克隆抗体发展的瓶颈。再循环抗体可以在胞外结合抗原,在细胞内与抗原解离,使抗体结合抗原次数最大化,减少抗原介导的抗体清除效应和抗体介导的抗原累积效应,并且再循环抗体可以通过进一步的Fc改造来加强与Fc受体的亲和力。文中综述了再循环抗体的研究进展,包括其特点、改造方法及展望。

Development of functional antibodies against influenza B virus by activation-induced cytidine deaminase in hybridoma cells

Dear Editor,Influenza B viruses(IBVs)have circulated among humans for more than 80 years.Seasonal influenza virus epidemics caused by two IBV lines(Victoria and Yamagata)and influenza A virus have considerable effects on public health globally and result in approximately290,000–650,000 annual influenza-attributed deaths(Caini et al.,2015;Pan et al.,2015).Currently,the most effective countermeasures against influenza B virus infections are influenza virus vaccines(Subbarao and Matsuoka,2013).However,these vaccines have limited efficacy because only strain-matched humoral immune responses are induced.

Efficient cutting path planning for a non-spherical tool based on an iso-scallop height distance field

Iso-scallop height machining means,when machining a freeform surface,the scallop height between any two neighboring tool paths on the surface will be a constant(i.e.,the given threshold),which is preferable among various freeform surface machining strategies due to its high machining efficiency as well as better machine tool’s dynamics.However,all the existing iso-scallop height path planning methods pertain to only the ball-end or flat-end types of tools.In recent years,the non-spherical cutting tool has become more and more popular,especially for five-axis machining of complex freeform surfaces,majorly owing to its non-constant curvature which can be utilized to adaptively fit the tool to the surface to both avoid the local gouging and enlarge the cutting width.However,there have been no reported works on iso-scallop height five-axis tool path generation for a non-spherical tool,and,in this paper,we present one.Specifically,we first define and construct two fields on the surface to be machined-the collision-free tool orientation field(vector)and the iso-scallop height distance field(scalar).The iso-lines of the scalar field and their associated tool orientation field vectors then naturally serve as potential iso-scallop height five-axis tool paths,and we present a propagation-based algorithm to construct the desired tool path from the iso-lines.The computer simulation and physical cutting experiments confirm that everywhere on the surface,except maybe near the saddle curves of the scalar filed,the scallop height is exactly the given thresh-old.By adding the saddle curves as extra tool paths,the final machined surface then is assured of the required scallop height requirement.