A major obstacle to the broad application of cathodic arc plasma deposition is the presence of macroparticles. In this paper, the properties of the large rectangular arc ion plating with a magnetic filtering shutter s...A major obstacle to the broad application of cathodic arc plasma deposition is the presence of macroparticles. In this paper, the properties of the large rectangular arc ion plating with a magnetic filtering shutter system to filter macroparticles are studied. It is proposed that the macroparticles in the plasma beam are effectively removed with the magnetic filtering shutter system, and the quality of the deposited films is improved.展开更多
文摘A major obstacle to the broad application of cathodic arc plasma deposition is the presence of macroparticles. In this paper, the properties of the large rectangular arc ion plating with a magnetic filtering shutter system to filter macroparticles are studied. It is proposed that the macroparticles in the plasma beam are effectively removed with the magnetic filtering shutter system, and the quality of the deposited films is improved.
