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长余辉发光材料的研究进展 被引量:21
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作者 李松坤 王小平 +7 位作者 王丽军 井龙伟 潘秀芳 王金烨 孙义清 孙洪涛 王子风 曹双迎 《材料导报》 EI CAS CSCD 北大核心 2014年第5期63-67,84,共6页
长余辉发光材料在太阳能转换和利用方面具有独特的优势,是一类重要的光-光转换和节能材料。综述了长余辉发光材料的光谱特性、余辉时间以及相应的发光机理,简单介绍了长余辉发光材料的一些常见制备方法,并对今后研究的重点和方向做了展望。
关键词 长余辉 发光 无机固体材料 发光机理
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White electroluminescence of n-ZnO:Al/p-diamond heterostructure devices 被引量:1
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作者 杨灿 王小平 +3 位作者 王丽军 潘秀芳 李松坤 井龙伟 《Chinese Physics B》 SCIE EI CAS CSCD 2013年第8期675-678,共4页
An n-ZnO:A1/p-boron-doped diamond heterostructure electroluminescent device is produced, and a rectifying be- havior can be observed. The electroluminescence spectrum at room temperature exhibits two visible bands ce... An n-ZnO:A1/p-boron-doped diamond heterostructure electroluminescent device is produced, and a rectifying be- havior can be observed. The electroluminescence spectrum at room temperature exhibits two visible bands centred at 450 nm-485 nm (blue emission) and 570 nm-640 nm (yellow emission). Light emission with a luminance of 15 cd/m2 is observed from the electroluminescent device at a forward applied voltage of 85 V, which is distinguished from white light by the naked eye. 展开更多
关键词 boron-doped diamond film ZnO:A1 HETEROJUNCTION ELECTROLUMINESCENCE
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Field emissions of graphene films deposited on different substrates by CVD system 被引量:1
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作者 王小平 刘晓菲 +5 位作者 刘欣欣 王丽军 杨灿 井龙伟 李松坤 潘秀芳 《Chinese Physics B》 SCIE EI CAS CSCD 2012年第12期499-502,共4页
Graphene films are deposited on copper (Cu) and aluminum (Al) substrates, respectively, by using a microwave plasma chemical vapour deposition technique. Furthermore, these graphene films are characterized by a fi... Graphene films are deposited on copper (Cu) and aluminum (Al) substrates, respectively, by using a microwave plasma chemical vapour deposition technique. Furthermore, these graphene films are characterized by a field emission type scanning electron microscope (FE-SEM), Raman spectra, and field emission (FE) I-V measurements. It is found that the surface morphologies of the films deposited on Cu and Al substrates are different: the field emission property of graphene film deposited on the Cu substrate is better than that on the Al substrate, and the lowest turn-on field of 2.4 V/p-m is obtained for graphene film deposited on the Cu substrate. The macroscopic areas of the graphene samples are all above 400 mm2. 展开更多
关键词 GRAPHENE chemical vapour deposition field emission
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