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阱接触面积对PMOS单粒子瞬态脉冲宽度的影响
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作者 刘蓉容 池雅庆 +1 位作者 何益百 窦强 《计算机工程与科学》 CSCD 北大核心 2015年第6期1053-1057,共5页
使用TCAD模拟工具分析了纳米工艺下阱接触面积对PMOS SET脉冲宽度的影响。结果表明,纳米工艺下,当存在脉冲窄化效应时,增加阱接触面积会导致SET脉冲变宽,这与传统的通过增加阱接触面积可抑制SET脉冲的观点正好相反。同时,还分析了不同... 使用TCAD模拟工具分析了纳米工艺下阱接触面积对PMOS SET脉冲宽度的影响。结果表明,纳米工艺下,当存在脉冲窄化效应时,增加阱接触面积会导致SET脉冲变宽,这与传统的通过增加阱接触面积可抑制SET脉冲的观点正好相反。同时,还分析了不同入射粒子LET值以及晶体管间距条件对该现象的作用趋势。 展开更多
关键词 阱接触面积 单粒子瞬态 PMOS 脉冲宽度
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Experimental verification of the parasitic bipolar amplification effect in PMOS single event transients
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作者 何益百 陈书明 《Chinese Physics B》 SCIE EI CAS CSCD 2014年第7期775-779,共5页
The contribution of parasitic bipolar amplification to SETs is experimentally verified using two P-hit target chains in the normal layout and in the special layout. For PMOSs in the normal layout, the single-event cha... The contribution of parasitic bipolar amplification to SETs is experimentally verified using two P-hit target chains in the normal layout and in the special layout. For PMOSs in the normal layout, the single-event charge collection is composed of diffusion, drift, and the parasitic bipolar effect, while for PMOSs in the special layout, the parasitic bipolar junction transistor cannot turn on. Heavy ion experimental results show that PMOSs without parasitic bipolar amplification have a 21.4% decrease in the average SET pulse width and roughly a 40.2% reduction in the SET cross-section. 展开更多
关键词 single event effect single event transient parasitic bipolar amplification heavy ion experiments
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Suppressing the hot carrier injection degradation rate in total ionizing dose effect hardened nMOSFETs 被引量:1
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作者 陈建军 陈书明 +3 位作者 梁斌 何益百 池雅庆 邓科峰 《Chinese Physics B》 SCIE EI CAS CSCD 2011年第11期346-352,共7页
Annular gate nMOSFETs are frequently used in spaceborne integrated circuits due to their intrinsic good capability of resisting total ionizing dose (TID) effect. However, their capability of resisting the hot carrie... Annular gate nMOSFETs are frequently used in spaceborne integrated circuits due to their intrinsic good capability of resisting total ionizing dose (TID) effect. However, their capability of resisting the hot carrier effect (HCE) has also been proven to be very weak. In this paper, the reason why the annular gate nMOSFETs have good TID but bad HCE resistance is discussed in detail, and an improved design to locate the source contacts only along one side of the annular gate is used to weaken the HCE degradation. The good TID and HCE hardened capability of the design are verified by the experiments for I/O and core nMOSFETs in a 0.18 μm bulk CMOS technology. In addition, the shortcoming of this design is also discussed and the TID and the HCE characteristics of the replacers (the annular source nMOSFETs) are also studied to provide a possible alternative for the designers. 展开更多
关键词 annular gate nMOSFETs total ionizing dose effect hot carrier effect annular sourcenMOSFETs
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The dual role of multiple-transistor charge sharing collection in single-event transients
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作者 郭阳 陈建军 +2 位作者 何益百 梁斌 刘必慰 《Chinese Physics B》 SCIE EI CAS CSCD 2013年第4期360-364,共5页
As technologies scale down in size, multiple-transistors being affected by a single ion has become a universal phenomenon, and some new effects are present in single event transients (SETs) due to the charge sharing... As technologies scale down in size, multiple-transistors being affected by a single ion has become a universal phenomenon, and some new effects are present in single event transients (SETs) due to the charge sharing collection of the adjacent multiple-transistors. In this paper, not only the off-state p-channel metal–oxide semiconductor field-effect transistor (PMOS FET), but also the on-state PMOS is struck by a heavy-ion in the two-transistor inverter chain, due to the charge sharing collection and the electrical interaction. The SET induced by striking the off-state PMOS is efficiently mitigated by the pulse quenching effect, but the SET induced by striking the on-state PMOS becomes dominant. It is indicated in this study that in the advanced technologies, the SET will no longer just be induced by an ion striking the off-state transistor, and the SET sensitive region will no longer just surround the off-state transistor either, as it is in the older technologies. We also discuss this issue in a three-transistor inverter in depth, and the study illustrates that the three-transistor inverter is still a better replacement for spaceborne integrated circuit design in advanced technologies. 展开更多
关键词 multiple-transistor charge sharing collection single event transient (SET) pulse quenching effect radiation hardened by design (RHBD)
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p型金属氧化物半导体场效应晶体管界面态的积累对单粒子电荷共享收集的影响
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作者 陈建军 陈书明 +4 位作者 梁斌 刘必慰 池雅庆 秦军瑞 何益百 《物理学报》 SCIE EI CAS CSCD 北大核心 2011年第8期509-517,共9页
由于负偏置温度不稳定性和热载流子注入,p型金属氧化物半导体场效应晶体管(pMOSFET)将在工作中不断退化,而其SiO2/Si界面处界面态的积累是导致其退化的主要原因之一.采用三维器件数值模拟方法,基于130nm体硅工艺,研究了界面态的积累对相... 由于负偏置温度不稳定性和热载流子注入,p型金属氧化物半导体场效应晶体管(pMOSFET)将在工作中不断退化,而其SiO2/Si界面处界面态的积累是导致其退化的主要原因之一.采用三维器件数值模拟方法,基于130nm体硅工艺,研究了界面态的积累对相邻pMOSFET之间单粒子电荷共享收集的影响.研究发现,随着pMOSFETSiO2/Si界面处界面态的积累,相邻pMOSFET漏端的单粒子电荷共享收集量均减少.还研究了界面态的积累对相邻反相器中单粒子电荷共享收集所导致的多瞬态脉冲的影响.研究发现,随着pMOSFETSiO2/Si界面处界面态的积累,pMOSFET之间电荷共享收集所导致的多瞬态脉冲压缩,而n型金属氧化物半导体场效应晶体管之间电荷共享收集所导致的多瞬态脉冲展宽. 展开更多
关键词 负偏置温度不稳定性 电荷共享收集 双极放大效应 单粒子多瞬态
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