This work investigated C2F6/O2/Ar plasma chemistry and its effect on the etching characteristics of SiCOH low-k dielectrics in 60 MHz/2 MHz dual-frequency capacitively coupled discharge. For the C2F6/Ar plasma, the in...This work investigated C2F6/O2/Ar plasma chemistry and its effect on the etching characteristics of SiCOH low-k dielectrics in 60 MHz/2 MHz dual-frequency capacitively coupled discharge. For the C2F6/Ar plasma, the increase in the low-frequency （LF） power led to an increased ion impact, prompting the dissociation of C2F6 with higher reaction energy. As a result, fluorocarbon radicals with a high F/C ratio decreased. The increase in the discharge pressure led to a decrease in the electron temperature, resulting in the decrease of C2F6 dissociation. For the C2F6/O2/Ar plasma, the increase in the LF power prompted the reaction between 02 and C2F6, resulting in the elimination of CF3 and CF2 radicals, and the production of an F-rich plasma environment. The F-rich plasma improved the etching characteristics of SiCOH low-k films, leading to a high etching rate and a smooth etched surface.展开更多
We investigate the effect of silicone oil viscosity on the aggregation behavior of C:F clusters deposited on silicone oil liquid substrates with viscous coefficients of 100,350 and 500mm^(2)/s by C4Fs dual-frequency c...We investigate the effect of silicone oil viscosity on the aggregation behavior of C:F clusters deposited on silicone oil liquid substrates with viscous coefficients of 100,350 and 500mm^(2)/s by C4Fs dual-frequency capacitively coupled plasma.The aggregated C:F chusters all exhibit a branch-like fractal structure.However,the fractal dimension decreases from 1.67 to 1.45 with the silicone oil viscous coefficient increasing from 100 mm^(2)/s to 500mm^(2)/s.Owing to the fractal dimension of 1.67 and 1.45,corresponding to the diffusion-limited-aggregation(DLA)model and the cluster-cluster-aggregation(CCA)model respectively,the results show that the increase of silicone oil viscosity can lead to the change of C:F clusters aggregating on a silicone oil liquid substrate from DLA to CCA growth.展开更多
基金supported by National Natural Science Foundation of China(Nos.10975105,11075114)
文摘This work investigated C2F6/O2/Ar plasma chemistry and its effect on the etching characteristics of SiCOH low-k dielectrics in 60 MHz/2 MHz dual-frequency capacitively coupled discharge. For the C2F6/Ar plasma, the increase in the low-frequency （LF） power led to an increased ion impact, prompting the dissociation of C2F6 with higher reaction energy. As a result, fluorocarbon radicals with a high F/C ratio decreased. The increase in the discharge pressure led to a decrease in the electron temperature, resulting in the decrease of C2F6 dissociation. For the C2F6/O2/Ar plasma, the increase in the LF power prompted the reaction between 02 and C2F6, resulting in the elimination of CF3 and CF2 radicals, and the production of an F-rich plasma environment. The F-rich plasma improved the etching characteristics of SiCOH low-k films, leading to a high etching rate and a smooth etched surface.
基金Supported by the National Natural Science Foundation of China under Grant Nos 10975105 and 11075114.
文摘We investigate the effect of silicone oil viscosity on the aggregation behavior of C:F clusters deposited on silicone oil liquid substrates with viscous coefficients of 100,350 and 500mm^(2)/s by C4Fs dual-frequency capacitively coupled plasma.The aggregated C:F chusters all exhibit a branch-like fractal structure.However,the fractal dimension decreases from 1.67 to 1.45 with the silicone oil viscous coefficient increasing from 100 mm^(2)/s to 500mm^(2)/s.Owing to the fractal dimension of 1.67 and 1.45,corresponding to the diffusion-limited-aggregation(DLA)model and the cluster-cluster-aggregation(CCA)model respectively,the results show that the increase of silicone oil viscosity can lead to the change of C:F clusters aggregating on a silicone oil liquid substrate from DLA to CCA growth.
