抛光液组分对3D微同轴中铜和光刻胶化学机械抛光速率选择性的影响

研究了碱性抛光液的pH、SiO_(2)磨料质量分数、H;O_(2)体积分数和甘氨酸质量分数对3D微同轴加工中铜和光刻胶化学机械抛光(CMP)去除速率的影响,得到较佳的抛光液组成为:SiO_(2)5%,H;O_(2)20 mL/L,甘氨酸2.5%,pH=10。采用该抛光液时,铜和光刻胶的去除速率非常接近,满足3D微同轴加工对铜和光刻胶CMP去除速率选择性的要求。

SYNTHESES AND SPECTRA OF BIS-(ALKYLCYCLOPENTADIENYL)-DIHALIDES OF TITANIUM, ZIRCONIUM AND HAFNIUM

Bis(alkylcyclopentadienyl) dichlorides of titanium, zirconium and hafnium were obtained according to the following equations.

STUDIES ON BIS(ALKYLCYCLOPENTADIENYL)-DI-(ARYLOXY) METALDERIVATIVES

We have studied systematically the reactions of bis(cyclopentadienyl)metal dichlorides with phenol or substituted phenols and ’HNMR of aryloxy derivatives. In this paper the reactions of bis (alkylcyclopentadienyl) dichlorides of tita-