Type-Ⅱ InAs/GaSb superlattiees made of 13 InAs monolayers （MLs） and 7 GaSb MLs are grown on GaSb substrates by solid source molecular beam epitaxy. To obtain lattice-matched structures, thin InSb layers are inserte...Type-Ⅱ InAs/GaSb superlattiees made of 13 InAs monolayers （MLs） and 7 GaSb MLs are grown on GaSb substrates by solid source molecular beam epitaxy. To obtain lattice-matched structures, thin InSb layers are inserted between InAs and GaSb layers. We complete a series of experiments to investigate the influence of the InSb deposition time, Ⅴ/Ⅲ beam-equivalent pressure ratio and interruption time between each layer, and then characterize the superlattice （SL） structures with high-resolution x-ray diffraction and atomic force microscopy. The optimized growth parameters are applied to grow the 100-period SL structure, resulting in the full-width half-maximum of 29.55 arcsee for the first SL satellite peak and zero lattice-mismatch between the zero-order SL peak and the GaSb substrate peak.展开更多
We investigate the molecular beam epitaxy growth of GaSb films on GaAs substrates using compositionally graded GaAsxSb1-x buffer layers. Optimization of GaAsxSb1-x growth parameter is aimed at obtaining high GaSb crys...We investigate the molecular beam epitaxy growth of GaSb films on GaAs substrates using compositionally graded GaAsxSb1-x buffer layers. Optimization of GaAsxSb1-x growth parameter is aimed at obtaining high GaSb crystal quality and smooth GaSb surface. The optimized growth temperature and thickness of GaAsxSb1-x layers are found to be 420 degrees C and 0.5 mu m, respectively. The smallest full width at half maximum value and the root mean square surface roughness of 0.67nm over 2 x 2 mu m(2) area are achieved as a 250nm GaSb film is grown under optimized conditions.展开更多
基金Supported by the National Basic Research Program of China under Grant Nos 2015CB351902,2015CB932402 and 2012CB619203the National Natural Science Foundation of China under Grant Nos 61177070,11374295 and U1431231the National Key Research Program of China under Grant No 2011ZX01015-001
文摘Type-Ⅱ InAs/GaSb superlattiees made of 13 InAs monolayers （MLs） and 7 GaSb MLs are grown on GaSb substrates by solid source molecular beam epitaxy. To obtain lattice-matched structures, thin InSb layers are inserted between InAs and GaSb layers. We complete a series of experiments to investigate the influence of the InSb deposition time, Ⅴ/Ⅲ beam-equivalent pressure ratio and interruption time between each layer, and then characterize the superlattice （SL） structures with high-resolution x-ray diffraction and atomic force microscopy. The optimized growth parameters are applied to grow the 100-period SL structure, resulting in the full-width half-maximum of 29.55 arcsee for the first SL satellite peak and zero lattice-mismatch between the zero-order SL peak and the GaSb substrate peak.
基金Supported by the National Basic Research Program of China under Grant Nos 2015CB351902,2015CB932402 and 2012CB619203the National Natural Science Foundation of China under Grant Nos 61177070,11374295 and U1431231the National Key Research Program of China under Grant No 2011ZX01015-001
文摘We investigate the molecular beam epitaxy growth of GaSb films on GaAs substrates using compositionally graded GaAsxSb1-x buffer layers. Optimization of GaAsxSb1-x growth parameter is aimed at obtaining high GaSb crystal quality and smooth GaSb surface. The optimized growth temperature and thickness of GaAsxSb1-x layers are found to be 420 degrees C and 0.5 mu m, respectively. The smallest full width at half maximum value and the root mean square surface roughness of 0.67nm over 2 x 2 mu m(2) area are achieved as a 250nm GaSb film is grown under optimized conditions.
