The Bijective Pattern Map maps the 3D surface patch to the 2D flat pattern. The bijection property has been proved. However, since the 3D Algebraic Mannequin is not developeable, meaning that it is not isometric to th...The Bijective Pattern Map maps the 3D surface patch to the 2D flat pattern. The bijection property has been proved. However, since the 3D Algebraic Mannequin is not developeable, meaning that it is not isometric to the 2D plane, the intrinsic geometry of the 3D surface patches is different from their images on the 2D plane. Consequently, distortion exists. The distortional property of the Bijective Pattern Map is discussed in this article.展开更多
This is the part n of the study of distortion property of the Bijective Pattern Map maps. In part I, the generic distortion was presented. In this article, the distortion using different set of reference points and pr...This is the part n of the study of distortion property of the Bijective Pattern Map maps. In part I, the generic distortion was presented. In this article, the distortion using different set of reference points and pre - image is compared with the result in part I. Moreover, the distortion induced by a change of reference is illustrated with examples. The formulation of the relationship between the distortion and the Gaussian curvature will be followed.展开更多
Due to different cultural and historical background, the technology in Western and Eastern pattern design is inherently different. Along with the development of technology, garment pattern design technique is making p...Due to different cultural and historical background, the technology in Western and Eastern pattern design is inherently different. Along with the development of technology, garment pattern design technique is making progress towards high effectiveness and accuracy. Many researchers proposed different alternative methodologies to improve the current pattern making processes. This article examines the development of Western and Eastern garment pattern design technique. The main objective of this article is to provide a thorough review and hence a better understanding to those researchers who made contribution on developing pattern design technique and continue their work in the future.展开更多
It is easy to apply lines in design drawings to create different styles, however, there is no guarantee that all the style lines drawn are able to be manufactured. In this paper, we focus on one undeliverable style to...It is easy to apply lines in design drawings to create different styles, however, there is no guarantee that all the style lines drawn are able to be manufactured. In this paper, we focus on one undeliverable style to enhance our understanding of the relationship between the design sketch and the pattern design process. In order to evidence that such style is unworkable, a systematic display of pattern development, and to be reinforced by mathematical evaluation, will be introduced and addressed. When one can easily detect design fault, waste of product development time can be minimized.展开更多
文摘The Bijective Pattern Map maps the 3D surface patch to the 2D flat pattern. The bijection property has been proved. However, since the 3D Algebraic Mannequin is not developeable, meaning that it is not isometric to the 2D plane, the intrinsic geometry of the 3D surface patches is different from their images on the 2D plane. Consequently, distortion exists. The distortional property of the Bijective Pattern Map is discussed in this article.
文摘This is the part n of the study of distortion property of the Bijective Pattern Map maps. In part I, the generic distortion was presented. In this article, the distortion using different set of reference points and pre - image is compared with the result in part I. Moreover, the distortion induced by a change of reference is illustrated with examples. The formulation of the relationship between the distortion and the Gaussian curvature will be followed.
基金This Research is Supported by the Tuition Scholarship from The Hong Kong Polytechnic University
文摘Due to different cultural and historical background, the technology in Western and Eastern pattern design is inherently different. Along with the development of technology, garment pattern design technique is making progress towards high effectiveness and accuracy. Many researchers proposed different alternative methodologies to improve the current pattern making processes. This article examines the development of Western and Eastern garment pattern design technique. The main objective of this article is to provide a thorough review and hence a better understanding to those researchers who made contribution on developing pattern design technique and continue their work in the future.
文摘It is easy to apply lines in design drawings to create different styles, however, there is no guarantee that all the style lines drawn are able to be manufactured. In this paper, we focus on one undeliverable style to enhance our understanding of the relationship between the design sketch and the pattern design process. In order to evidence that such style is unworkable, a systematic display of pattern development, and to be reinforced by mathematical evaluation, will be introduced and addressed. When one can easily detect design fault, waste of product development time can be minimized.
