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利用去湿现象制备图案化的离子刻蚀聚合物保护层 被引量:4
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作者 陆广 曹召良 +5 位作者 卢振武 李伟 姚计敏 张刚 杨柏 沈家骢 《高等学校化学学报》 SCIE EI CAS CSCD 北大核心 2002年第12期2390-2392,共3页
A novel method using a combination of microcontact printing(μCP) technique, surface-directed condensation and surface- directed dewetting has been developed to fabricate patterned polymer films on gold substrates. Th... A novel method using a combination of microcontact printing(μCP) technique, surface-directed condensation and surface- directed dewetting has been developed to fabricate patterned polymer films on gold substrates. These patterned polymer films can serve as resists in the argon ion etching effectively to transfer patterns into the underlying gold substrates. This method is flexible in controlling the shape and feature size of the patterns in the polymer resists by simply adjusting the concentration of polymer solution, and especially it also provides a route to sub-micrometer sized features by using an original template with micrometer sized features. 展开更多
关键词 支湿现象 制备 聚合物保护层 聚合物薄膜 微接触印刷 自组装单层膜 离子刻蚀 表面图案化
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