Two strong photoluminescence （PL） bands in the spectral range of 550\900 nm have been observed at room temperature from a series of a\|SiO\-\%x\%∶H films fabricated by plasma\|enhanced chemical vapor deposition （P...Two strong photoluminescence （PL） bands in the spectral range of 550\900 nm have been observed at room temperature from a series of a\|SiO\-\%x\%∶H films fabricated by plasma\|enhanced chemical vapor deposition （PECVD） technique. One is composed of a main band in the red\|light region and a shoulder; the other is located at about 850 nm, only found after 1170℃ annealing in N\-2 atmosphere. In conjunction with infrared （IR） and micro\|Raman spectra, it is thought that the two PL bands are associated with a\|Si clusters in the SiO\-\%x\% network and nanocrystalline silicon in SiO\-2, respectively.展开更多
文摘Two strong photoluminescence （PL） bands in the spectral range of 550\900 nm have been observed at room temperature from a series of a\|SiO\-\%x\%∶H films fabricated by plasma\|enhanced chemical vapor deposition （PECVD） technique. One is composed of a main band in the red\|light region and a shoulder; the other is located at about 850 nm, only found after 1170℃ annealing in N\-2 atmosphere. In conjunction with infrared （IR） and micro\|Raman spectra, it is thought that the two PL bands are associated with a\|Si clusters in the SiO\-\%x\% network and nanocrystalline silicon in SiO\-2, respectively.
